EUV Mechanistic Studies of Antimony Resists

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  • Murphy Michael
    College of Nanoscale Science and Engineering, SUNY Polytechnic Institute
  • Narasimhan Amrit
    College of Nanoscale Science and Engineering, SUNY Polytechnic Institute
  • Grzeskowiak Steven
    College of Nanoscale Science and Engineering, SUNY Polytechnic Institute
  • Sitterly Jacob
    College of Nanoscale Science and Engineering, SUNY Polytechnic Institute
  • Schuler Philip
    College of Nanoscale Science and Engineering, SUNY Polytechnic Institute
  • Richards Jeff
    College of Nanoscale Science and Engineering, SUNY Polytechnic Institute
  • Denbeaux Greg
    College of Nanoscale Science and Engineering, SUNY Polytechnic Institute
  • Brainard Robert L.
    College of Nanoscale Science and Engineering, SUNY Polytechnic Institute

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We have developed a method to study the photomechanism of our antimony carboxylate platform Ph3Sb(O2CR')2. A series of mechanistic studies followed the production of reaction byproducts by mass spectrometer, as they leave the film during exposure to EUV photons or 80 eV electrons. The major volatile products are CO2, benzene and phenol. The rate of outgassing is well-correlated with the reaction energy of decarboxylation of the carboxylate ligand as determined by density functional theory. Additionally, a deuterium labeling study was conducted to determine the source of hydrogen needed to convert phenyl and phenoxy to benzene and phenol. Specifically, EUV exposure of Ph3Sb(O2CCD3)2 creates d0-benzene and d1-phenol with >95% isotopic purity. Several mechanistic pathways are proposed and discussed.

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