Effects of Nanoscaled Tin-Doped Indium Oxide on the Image Sticking Property of Liquid Crystal Cells

    • Liang Bau-Jy Bau-Jy Liang
    • Department of Electrical Engineering, Feng Chia University, 100 Wenhwa Rd., Seatwen, Taichung, Taiwan 40724, R.O.C.
    • Liu Don-Gey Don-Gey Liu
    • Department of Electronic Engineering, Feng Chia University, 100 Wenhwa Rd., Seatwen, Taichung, Taiwan 40724, R.O.C.
    • Sy-Ruen Huang
    • Department of Electrical Engineering, Feng Chia University, 100 Wenhwa Rd., Seatwen, Taichung, Taiwan 40724, R.O.C.

抄録

Unusual residual time of image sticking under high-voltage electrostatic discharge (ESD) stress on liquid crystal (LC) cells has been observed. It was found that nanoscaled conductive particles doped in LC cells can significantly reduce the residual time of image sticking and the breakdown voltage of the LC cells. This finding can help to protect the doped cells from the attacks of ESD and thus to improve their displaying performance and reliability. In this study, nanoscaled tin-doped indium oxide (ITO) powders were uniformly mixed with high-resistance LC to form a suspension solution. In order to investigate other effects of ITO particles on the LC at high and low voltages, optical and electrical characteristics were compared for the doped cells and those samples without intentional doping. According to the measurement results, it is interesting to find that, except the breakdown characteristic, no other properties in the doped samples were changed with respect to the displaying functions under normal operational voltage.

収録刊行物

Jpn J Appl Phys  

Jpn J Appl Phys 49(2), 025004-025004-6, 2010-02-25 

Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physics

各種コード

  • NII論文ID(NAID) :
    150000053501
  • NII書誌ID(NCID) :
    AA12295836
  • 本文言語コード :
    EN
  • 雑誌種別 :
    大学紀要
  • ISSN :
    0021-4922
  • NDL 記事登録ID :
    10572723
  • NDL 雑誌分類 :
    ZM35(科学技術--物理学)
  • NDL 請求記号 :
    Z53-A375
  • 収録DB :
    NDL  JSAP/JPS