Improvement of the Magnetic Characteristics of Ni-Fe/Al Multilayers by Application of In-plane Fields during Sputtering.

• Ichihara T.

  Department of Physical Electronics, Tokyo Institute of Technology

• Nakagawa S.

  Department of Physical Electronics, Tokyo Institute of Technology

• Naoe M.

  Department of Physical Electronics, Tokyo Institute of Technology

Bibliographic Information

Other Title

• スパッタ中膜面磁界によるＮｉ‐Ｆｅ／Ａｌ多層膜の軟磁気特性の改善

Abstract

It has been recognized that the soft magnetic characteristics of Ni-Fe thin films deteriorate as the thickness of the film increases. In this study, therefore, magnetic multilayers composed of Ni-Fe layers and paramagnetic Al interlayers were prepared. The Ni-Fe/Al multilayers possessed good soft magnetic characteristics when the Al interlayers were thicker than 5 nm. Some Ni-Fe single layers and Ni-Fe/Al multilayers were prepared by applying an external field H_tr of about 200 Oe along the film plane and transverse to the direction of a plasma confining field H_p of about 30 Oe in the facing targets sputtering system. The films had very high permeability when a strong external field H_tr were applied. For the Ni-Fe/Al multilayers, the permeability was especially isotropically high when both of H_p and H_tr were applied.

Journal

• Journal of the Magnetics Society of Japan

  Journal of the Magnetics Society of Japan 20 (2), 333-336, 1996

  The Magnetics Society of Japan

Keywords

• Ni-Fe/Al multilayers
• facing targets sputtering system
• external magnetic field
• soft magnetic characteristics
• in-plane magnetic anisotropy

Details

• CRID: 1390282680070050944
• NII Article ID: 20000346131
• NII Book ID: AN0031390X
• DOI: 10.3379/jmsjmag.20.333
• COI: 1:CAS:528:DyaK28XivFChu78%3D
• ISSN: 18804004
• ISSN: 02850192
• Text Lang: ja
• Data Source:
  • JaLC
  • Crossref
  • CiNii Articles
• Abstract License Flag: Disallowed