ＮｉＦｅ／ＦｅＭｎ膜の交換結合における熱処理の効果

• 金井 均

  富士通株式会社・先端テクノロジ研究部

• 兼 淳一

  富士通株式会社・先端テクノロジ研究部

• 山本 尚之

  富士通株式会社・先端テクノロジ研究部

書誌事項

タイトル別名

• Effect of Annealing on Exchange-Coupled NiFe/FeMn Films.

抄録

The effects of thermal annealing (from 25°C to 300°C ) on exchange-coupling fields in NiFe/FeMn films were investigated. The exchange-coupling fields decrease with an increase in the temperature from 90°C to 210°C but remain constant at 210°C or higher in Ta/NiFe/FeMn films with a Ta underlayer. However, the exchange-coupling fields in these annealed Ta/NiFe/FeMn films make a dramatic recovery if the FeMn layers are thinned by ion-milling and annealed again at 210°C or higher. These changes in the exchange-coupling fields are explained as thermal fluctuations in FeMn spins. On the other hand, the exchangecoupling fields increase at 210°C or higher in NiFe/FeMn films without Ta underlayers. XPS depth-profile results reveal interdiffusion in the NiFe-FeMn interface after annealing at higher than 210°C in the NiFe/FeMn films.

収録刊行物

• 日本応用磁気学会誌

  日本応用磁気学会誌 20 (2), 361-364, 1996

  公益社団法人 日本磁気学会

キーワード

• FeMn
• antiferromagnetic
• exchange-coupling
• annealing
• MR head
• spin-valve head
• XPS

詳細情報

• CRID: 1390282680069990528
• NII論文ID: 20000346213
• NII書誌ID: AN0031390X
• DOI: 10.3379/jmsjmag.20.361
• COI: 1:CAS:528:DyaK28XivFChu7Y%3D
• ISSN: 18804004
• ISSN: 02850192
• ISSN: http://id.crossref.org/issn/02850192
• 本文言語コード: ja
• データソース種別:
  • JaLC
  • Crossref
  • CiNii Articles
• 抄録ライセンスフラグ: 使用不可