Structural relaxation of SiO2/Si interfacial layer during annealing

• Naoki Awaji

• Satoshi Ohkubo

• Toshiro Nakanishi

• Kanetake Takasaki

• Satoshi Komiya

Journal

• Applied Surface Science

  Applied Surface Science 117-118 221-224, 1997-06

  Elsevier BV

Keywords

• Surfaces, Coatings and Films
• Condensed Matter Physics
• Surfaces and Interfaces
• General Physics and Astronomy
• General Chemistry

Details

• CRID: 1363670320009675904
• NII Article ID: 30002964602
• NII Book ID: AA10503400
• DOI: 10.1016/s0169-4332(97)80083-9
• ISSN: 01694332
• Web Site: https://api.elsevier.com/content/article/PII:S0169433297800839?httpAccept=text/xml
• Web Site: https://api.elsevier.com/content/article/PII:S0169433297800839?httpAccept=text/plain
• Data Source:
  • Crossref
  • CiNii Articles