Proton channeling into the Si substrate at the bottom of ultrahigh-aspect-ratio contact holes during plasma etching

• Takashi Ichimori

• Naokatsu Ikegami

• Norio Hirashita

• Jun Kanamori

収録刊行物

• Thin Solid Films

  Thin Solid Films 374 (2), 228-234, 2000-10

  Elsevier BV

キーワード

• Materials Chemistry
• Metals and Alloys
• Surfaces, Coatings and Films
• Surfaces and Interfaces
• Electronic, Optical and Magnetic Materials

詳細情報

• CRID: 1361981469079240192
• NII論文ID: 30006174083
• DOI: 10.1016/s0040-6090(00)01154-8
• ISSN: 00406090
• Web Site: https://api.elsevier.com/content/article/PII:S0040609000011548?httpAccept=text/xml
• Web Site: https://api.elsevier.com/content/article/PII:S0040609000011548?httpAccept=text/plain
• データソース種別:
  • Crossref
  • CiNii Articles