Noble gas influence on reactive radio frequency magnetron sputter deposition of TiN films

• C.P Lungu

• M Futsuhara

• O Takai

• M Braic

• G Musa

収録刊行物

• Vacuum

  Vacuum 51 (4), 635-640, 1998-12

  Elsevier BV

キーワード

• Surfaces, Coatings and Films
• Condensed Matter Physics
• Instrumentation

詳細情報

• CRID: 1360011145916474112
• NII論文ID: 30008483837
• DOI: 10.1016/s0042-207x(98)00264-4
• ISSN: 0042207X
• Web Site: https://api.elsevier.com/content/article/PII:S0042207X98002644?httpAccept=text/xml
• Web Site: https://api.elsevier.com/content/article/PII:S0042207X98002644?httpAccept=text/plain
• データソース種別:
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  • CiNii Articles