Application of Ion Attachment Mass Spectrometry to Evolved Gas Analysis for in Situ Monitoring of Porous Ceramic Processing

  • Takahisa Tsugoshi
    Advanced Manufacturing Research Institute, National Institute of Advanced Industrial Science and Technology (AIST) and Canon ANELVA Technix Corporation, 2266-98 Anagahora, Shimo-Shidami, Moriyama-ku, Nagoya 463-8560, Japan
  • Takaaki Nagaoka
    Advanced Manufacturing Research Institute, National Institute of Advanced Industrial Science and Technology (AIST) and Canon ANELVA Technix Corporation, 2266-98 Anagahora, Shimo-Shidami, Moriyama-ku, Nagoya 463-8560, Japan
  • Megumi Nakamura
    Advanced Manufacturing Research Institute, National Institute of Advanced Industrial Science and Technology (AIST) and Canon ANELVA Technix Corporation, 2266-98 Anagahora, Shimo-Shidami, Moriyama-ku, Nagoya 463-8560, Japan
  • Yoshiro Shiokawa
    Advanced Manufacturing Research Institute, National Institute of Advanced Industrial Science and Technology (AIST) and Canon ANELVA Technix Corporation, 2266-98 Anagahora, Shimo-Shidami, Moriyama-ku, Nagoya 463-8560, Japan
  • Koji Watari
    Advanced Manufacturing Research Institute, National Institute of Advanced Industrial Science and Technology (AIST) and Canon ANELVA Technix Corporation, 2266-98 Anagahora, Shimo-Shidami, Moriyama-ku, Nagoya 463-8560, Japan

Journal

  • Analytical Chemistry

    Analytical Chemistry 78 (7), 2366-2369, 2006-02-24

    American Chemical Society (ACS)

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