Improved microscratch hardness of ion-plated carbon film by nitrogen inclusion evaluated by atomic force microscope

• S. Miyake

  Nippon Institute of Technology, 4-1 Gakuendai, Miyashiro-machi, Saitama, 345 Japan

• S. Watanabe

  Nippon Institute of Technology, 4-1 Gakuendai, Miyashiro-machi, Saitama, 345 Japan

• H. Miyazawa

  Nippon Institute of Technology, 4-1 Gakuendai, Miyashiro-machi, Saitama, 345 Japan

• M. Murakawa

  Nippon Institute of Technology, 4-1 Gakuendai, Miyashiro-machi, Saitama, 345 Japan

• R. Kaneko

  NTT Interdisciplinary Research Laboratories, 3-9-11, Midori-cho, Musashino-shi, Toyko, 180 Japan

• T. Miyamoto

  NTT Interdisciplinary Research Laboratories, 3-9-11, Midori-cho, Musashino-shi, Toyko, 180 Japan

抄録

Nitrogen-containing carbon films where deposited by reactive ion plating under a pure nitrogen ambient. Knoop hardness, microindentation hardness, and microscratch hardness of these films were evaluated. Indentation hardness, such as Knoop hardness and microindentation hardness, is influenced by surface roughness and substrate hardness, so the effect of nitrogen inclusion on the hardness cannot be clearly evaluated. In contrast, an atomic force microscope can clearly evaluate the effect of nitrogen inclusion on scratched wear depth.

収録刊行物

• Applied Physics Letters

  Applied Physics Letters 65 (25), 3206-3208, 1994-12-19

  AIP Publishing

キーワード

• Physics and Astronomy (miscellaneous)

詳細情報

• CRID: 1362262946382157952
• NII論文ID: 30015780339
• DOI: 10.1063/1.112414
• ISSN: 10773118
• ISSN: 00036951
• Web Site: https://pubs.aip.org/aip/apl/article-pdf/65/25/3206/18508652/3206_1_online.pdf
• データソース種別:
  • Crossref
  • CiNii Articles