Development of a multifunctional surface analysis system based on a nanometer scale scanning electron beam: Combination of ultrahigh vacuum-scanning electron microscopy, scanning reflection electron microscopy, Auger electron spectroscopy, and x-ray photoelectron spectroscopy
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- Heiji Watanabe
- Joint Research Center for Atom Technology, Angstrom Technology Partnership (JRCAT-ATP), c/o National Institute for Advanced Interdisciplinary Research (NAIR), 1-1-4 Higashi, Tsukuba, Ibaraki 305, Japan
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- Masakazu Ichikawa
- Joint Research Center for Atom Technology, Angstrom Technology Partnership (JRCAT-ATP), c/o National Institute for Advanced Interdisciplinary Research (NAIR), 1-1-4 Higashi, Tsukuba, Ibaraki 305, Japan
抄録
<jats:p>We have developed a multifunctional surface analysis system based on a scanning electron beam for nanofabrication and characterization of surface reactions for fabrication processes. The system performs scanning electron microscopy (SEM), scanning reflection electron microscopy (SREM), Auger electron spectroscopy (AES), and x-ray photoelectron spectroscopy. Nanometer scale resolution is obtained for ultrahigh vacuum (UHV)-SEM while the mechanical pumping instruments are operated. Single atomic steps on Si(111) surfaces are observed through SREM. Surface sensitive AES measurement is achieved with SREM geometry; this has a great advantage for investigating atomic step related surface reactions. High spatial resolution AES analysis is also achieved by using a nanometer scale probe beam. Auger electron signals from a hundred Ag atoms on a Si(111) surface are successfully detected with high sensitivity.</jats:p>
収録刊行物
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- Review of Scientific Instruments
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Review of Scientific Instruments 67 (12), 4185-4190, 1996-12-01
AIP Publishing
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詳細情報 詳細情報について
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- CRID
- 1363951794894959360
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- NII論文ID
- 30015943691
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- ISSN
- 10897623
- 00346748
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- データソース種別
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