Study of Conditions for Anisotropic Plasma Etching of Tungsten and Tungsten Nitride Using SF[sub 6]/Ar Gas Mixtures
収録刊行物
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- Journal of The Electrochemical Society
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Journal of The Electrochemical Society 149 (3), G179-, 2002
The Electrochemical Society
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詳細情報
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- CRID
- 1360298344406124672
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- NII論文ID
- 30016148142
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- ISSN
- 00134651
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- データソース種別
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- Crossref
- CiNii Articles