Dual‐Bath Electrodeposition of Cu/Ni Compositionally Modulated Multilayers
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- A. S. M. A. Haseeb
- Department of Metallurgy and Materials Engineering, Katholieke Universiteit Leuven de Croylaan 2, 3001 Leuven, Belgium
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- J. P. Celis
- Department of Metallurgy and Materials Engineering, Katholieke Universiteit Leuven de Croylaan 2, 3001 Leuven, Belgium
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- J. R. Roos
- Department of Metallurgy and Materials Engineering, Katholieke Universiteit Leuven de Croylaan 2, 3001 Leuven, Belgium
収録刊行物
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- Journal of The Electrochemical Society
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Journal of The Electrochemical Society 141 (1), 230-237, 1994-01-01
The Electrochemical Society
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詳細情報 詳細情報について
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- CRID
- 1363107370702653312
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- NII論文ID
- 30016154085
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- ISSN
- 19457111
- 00134651
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- データソース種別
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- Crossref
- CiNii Articles