Mass Spectrometric and Kinetic Study of Low‐Pressure Chemical Vapor Deposition of Si3 N 4 Thin Films from SiH2Cl2 and  NH 3

• Tetsuji Sorita

  Mitsubishi Electric Corporation, Central Research Laboratory, 1‐1, Tsukaguchi Honmachi 8‐chome, Amagasaki, Hyogo 661, Japan

• Tetsuya Satake

  Mitsubishi Electric Corporation, Central Research Laboratory, 1‐1, Tsukaguchi Honmachi 8‐chome, Amagasaki, Hyogo 661, Japan

• Hiroshi Adachi

  Mitsubishi Electric Corporation, Central Research Laboratory, 1‐1, Tsukaguchi Honmachi 8‐chome, Amagasaki, Hyogo 661, Japan

• Tamotsu Ogata

  Mitsubishi Electric Corporation, Central Research Laboratory, 1‐1, Tsukaguchi Honmachi 8‐chome, Amagasaki, Hyogo 661, Japan

• Kiyoteru Kobayashi

  Mitsubishi Electric Corporation, Central Research Laboratory, 1‐1, Tsukaguchi Honmachi 8‐chome, Amagasaki, Hyogo 661, Japan

Journal

• Journal of The Electrochemical Society

  Journal of The Electrochemical Society 141 (12), 3505-3511, 1994-12-01

  The Electrochemical Society

Keywords

• Materials Chemistry
• Electrochemistry
• Surfaces, Coatings and Films
• Condensed Matter Physics
• Renewable Energy, Sustainability and the Environment
• Electronic, Optical and Magnetic Materials

Details

• CRID: 1360292619086812416
• NII Article ID: 30016154442
• DOI: 10.1149/1.2059361
• ISSN: 19457111
• ISSN: 00134651
• ISSN: http://id.crossref.org/issn/00134651
• Web Site: https://iopscience.iop.org/article/10.1149/1.2059361
• Web Site: https://iopscience.iop.org/article/10.1149/1.2059361/pdf
• Data Source:
  • Crossref
  • CiNii Articles