Synchrotron Radiation‐Excited Chemical Vapor Deposition of Silicon Nitride Films from a SiH4 +  NH 3 Gas Mixture

• Hakaru Kyuragi

  NTT LSI Laboratories, 3‐1, Morinosato Wakamiya, Atsugi‐shi, Kanagawa‐prefecture, 243‐01 Japan

• Tsuneo Urisu

  NTT LSI Laboratories, 3‐1, Morinosato Wakamiya, Atsugi‐shi, Kanagawa‐prefecture, 243‐01 Japan

収録刊行物

• Journal of The Electrochemical Society

  Journal of The Electrochemical Society 138 (11), 3412-3416, 1991-11-01

  The Electrochemical Society

キーワード

• Materials Chemistry
• Electrochemistry
• Surfaces, Coatings and Films
• Condensed Matter Physics
• Renewable Energy, Sustainability and the Environment
• Electronic, Optical and Magnetic Materials

詳細情報

• CRID: 1360299773113059840
• NII論文ID: 30016155285
• NII書誌ID: AA00697016
• DOI: 10.1149/1.2085424
• ISSN: 19457111
• ISSN: 00134651
• Web Site: https://iopscience.iop.org/article/10.1149/1.2085424
• Web Site: https://iopscience.iop.org/article/10.1149/1.2085424/pdf
• データソース種別:
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  • CiNii Articles