High‐Temperature‐Post‐Exposure Bake Process (HIT‐PEB) for Base‐Developable Polyimides Consisting of Diazonaphthoquinones and Polyamic Acids

• Shuzi Hayase

  Chemical Laboratory, Toshiba Corporation, Komukai‐Toshiba‐cho, Saiwai‐ku, Kawasaki 210, Japan

• Kei Takano

  Chemical Laboratory, Toshiba Corporation, Komukai‐Toshiba‐cho, Saiwai‐ku, Kawasaki 210, Japan

• Yukihiro Mikogami

  Chemical Laboratory, Toshiba Corporation, Komukai‐Toshiba‐cho, Saiwai‐ku, Kawasaki 210, Japan

• Yoshihiko Nakano

  Chemical Laboratory, Toshiba Corporation, Komukai‐Toshiba‐cho, Saiwai‐ku, Kawasaki 210, Japan

収録刊行物

• Journal of The Electrochemical Society

  Journal of The Electrochemical Society 138 (12), 3625-3629, 1991-12-01

  The Electrochemical Society

キーワード

• Materials Chemistry
• Electrochemistry
• Surfaces, Coatings and Films
• Condensed Matter Physics
• Renewable Energy, Sustainability and the Environment
• Electronic, Optical and Magnetic Materials

詳細情報

• CRID: 1361418520354144128
• NII論文ID: 30016155332
• DOI: 10.1149/1.2085469
• ISSN: 19457111
• ISSN: 00134651
• ISSN: http://id.crossref.org/issn/00134651
• Web Site: https://iopscience.iop.org/article/10.1149/1.2085469
• Web Site: https://iopscience.iop.org/article/10.1149/1.2085469/pdf
• データソース種別:
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  • CiNii Articles