Reaction Mechanisms of Plasma‐ and Thermal‐Assisted Chemical Vapor Deposition of Tetraethylorthosilicate Oxide Films

• S. Nguyen

  IBM General Technology Division, Essex Junction, Vermont 05452

• D. Dobuzinsky

  IBM General Technology Division, Essex Junction, Vermont 05452

• D. Harmon

  IBM General Technology Division, Essex Junction, Vermont 05452

• R. Gleason

  IBM General Technology Division, Essex Junction, Vermont 05452

• S. Fridmann

  IBM General Technology Division, Essex Junction, Vermont 05452

収録刊行物

• Journal of The Electrochemical Society

  Journal of The Electrochemical Society 137 (7), 2209-2215, 1990-07-01

  The Electrochemical Society

キーワード

• Materials Chemistry
• Electrochemistry
• Surfaces, Coatings and Films
• Condensed Matter Physics
• Renewable Energy, Sustainability and the Environment
• Electronic, Optical and Magnetic Materials

詳細情報

• CRID: 1360011146611780736
• NII論文ID: 30016157061
• DOI: 10.1149/1.2086914
• ISSN: 19457111
• ISSN: 00134651
• Web Site: https://iopscience.iop.org/article/10.1149/1.2086914
• Web Site: https://iopscience.iop.org/article/10.1149/1.2086914/pdf
• データソース種別:
  • Crossref
  • CiNii Articles