Study of the Reaction of Si2 H 6 in the Presence of  C 2 H 2 in Synthesis of SiC Films by LPCVD Using a Macro/microcavity Method

  • Lu‐Sheng Hong
    Department of Chemical Engineering, The University of Tokyo, 7‐3‐1 Hongo, Bunkyo‐ku, Tokyo 113, Japan
  • Yukihiro Shimogaki
    Department of Chemical Engineering, The University of Tokyo, 7‐3‐1 Hongo, Bunkyo‐ku, Tokyo 113, Japan
  • Yasuyuki Egashira
    Department of Chemical Engineering, The University of Tokyo, 7‐3‐1 Hongo, Bunkyo‐ku, Tokyo 113, Japan
  • Hiroshi Komiyama
    Department of Chemical Engineering, The University of Tokyo, 7‐3‐1 Hongo, Bunkyo‐ku, Tokyo 113, Japan

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