Diffusion mechanisms of a Si adatom on H-terminated Si(100) surfaces

• Sukmin Jeong

• Atsushi Oshiyama

収録刊行物

• Physical Review B

  Physical Review B 58 (19), 12958-12963, 1998-11-15

  American Physical Society (APS)

詳細情報

• CRID: 1361981469935160448
• NII論文ID: 30019004495
• DOI: 10.1103/physrevb.58.12958
• ISSN: 10953795
• ISSN: 01631829
• Web Site: http://link.aps.org/article/10.1103/PhysRevB.58.12958
• Web Site: http://harvest.aps.org/v2/journals/articles/10.1103/PhysRevB.58.12958/fulltext
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