High-Average Power EUV Light Source for the Next-Generation Lithography by Laser-Produced Plasma

• A. Endo

収録刊行物

• IEEE Journal of Selected Topics in Quantum Electronics

  IEEE Journal of Selected Topics in Quantum Electronics 10 (6), 1298-1306, 2004-11

  Institute of Electrical and Electronics Engineers (IEEE)

キーワード

• Electrical and Electronic Engineering
• Atomic and Molecular Physics, and Optics

詳細情報

• CRID: 1361418518588505216
• NII論文ID: 30020070057
• DOI: 10.1109/jstqe.2004.837715
• ISSN: 1077260X
• Web Site: http://xplorestaging.ieee.org/ielx5/2944/30284/01390906.pdf?arnumber=1390906
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