Diagnostics of microwave plasma by laser induced fluorescence

• Ken Ninomiya

  Central Research Laboratory, Hitachi, Ltd., Kokubunji, Tokyo 185, Japan

• Keizo Suzuki

  Central Research Laboratory, Hitachi, Ltd., Kokubunji, Tokyo 185, Japan

• Shigeru Nishimatsu

  Central Research Laboratory, Hitachi, Ltd., Kokubunji, Tokyo 185, Japan

• Osami Okada

  Central Research Laboratory, Hitachi, Ltd., Kokubunji, Tokyo 185, Japan

抄録

CF radicals in a C3F8 microwave plasma were detected by laser induced fluorescence (LIF). CF2 radicals in C3F8 and CF4 plasma were also observed by using the same technique. At discharge pressures of 0.13 and 4.0 Pa, the relative densities of both radicals were measured as a function of microwave input power over a range of 40–240 W. The dependencies of these radical densities on discharge pressure were also measured over a pressure range of 6.7×10−2 to 13 Pa. The reaction mechanism in the plasma is discussed in terms of experimental results.

収録刊行物

• Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

  Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 4 (3), 1791-1794, 1986-05-01

  American Vacuum Society

キーワード

• Surfaces, Coatings and Films
• Surfaces and Interfaces
• Condensed Matter Physics

詳細情報

• CRID: 1360857674599128192
• NII論文ID: 30020301499
• DOI: 10.1116/1.573939
• ISSN: 15208559
• ISSN: 07342101
• Web Site: https://pubs.aip.org/avs/jva/article-pdf/4/3/1791/11485396/1791_1_online.pdf
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