Fabrication and characterization of a micromachined 5 mm inductively coupled plasma generator

• J. Hopwood

  Electrical and Computer Engineering Department, Northeastern University, Boston, Massachusetts 02115

• O. Minayeva

  Electrical and Computer Engineering Department, Northeastern University, Boston, Massachusetts 02115

• Y. Yin

  Electrical and Computer Engineering Department, Northeastern University, Boston, Massachusetts 02115

抄録

The electron temperature and ion density produced by a microfabricated plasma generator are characterized in both argon gas and air. The plasma generator sustains a discharge by inductively coupling 450 MHz rf power into a small (10 mm diameter) vacuum chamber. The inductively coupled plasma source is surface micromachined on a glass wafer by electroplating a planar spiral inductor and two interdigitated capacitors. A plasma can be sustained using gas pressures between 0.1 and 10 Torr and rf powers between 0.3 and 3 W. The ion density increases from 1010 to 1011 cm−3 over this range of power. The electron temperature decreases from 4 to 2 eV as the pressure increases from 0.1 to 1 Torr.

収録刊行物

• Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena

  Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena 18 (5), 2446-2451, 2000-09-01

  American Vacuum Society

キーワード

• Electrical and Electronic Engineering
• Condensed Matter Physics

詳細情報

• CRID: 1362544420432978304
• NII論文ID: 30020315799
• DOI: 10.1116/1.1288945
• ISSN: 15208567
• ISSN: 10711023
• Web Site: https://pubs.aip.org/avs/jvb/article-pdf/18/5/2446/8202865/2446_1_online.pdf
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