Variable cell projection as an advance in electron-beam cell projection system

• Akio Yamada

  ADVANTEST Corporation , 1-5, Shin-tone, Otone-machi, Saitama 349-1158, Japan

• Takayuki Yabe

  ADVANTEST Corporation , 1-5, Shin-tone, Otone-machi, Saitama 349-1158, Japan

抄録

As an advance in the electron-beam cell projection system, we have developed a deflection control and correction unit of the variable cell projection (VCP) system, which can increase the variety of projected images through a block of patterns on a CP mask. We estimate the extent of the minimum spacing between two patterns distinguished by partial illumination to be 58 nm on a wafer, which is due to the beam blur of 28 nm and the illuminating beam edge rotation of 6 mrad relative to the CP mask patterns. Exposure results show that the VCP can actually distinguish the patterns separated by 80 nm on a wafer. We also show that the VCP can improve the uniformity of linewidths of exposed patterns by about 5 nm compared with the simple VSB method.

収録刊行物

• Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena

  Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena 22 (6), 2917-2922, 2004-11-01

  American Vacuum Society

キーワード

• Electrical and Electronic Engineering
• Condensed Matter Physics

詳細情報

• CRID: 1360018298136561408
• NII論文ID: 30020324460
• DOI: 10.1116/1.1808741
• ISSN: 15208567
• ISSN: 10711023
• Web Site: https://pubs.aip.org/avs/jvb/article-pdf/22/6/2917/15999590/2917_1_online.pdf
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