Methodology for Accurate Oxygen Distribution Analysis and Its Application to YBa<sub>2</sub>Cu<sub>3</sub>O<sub>x</sub> Thin Films Using <sup>16</sup>O(α, α)<sup>16</sup>O 3.045 MeV Resonance Reaction

DOI Web Site Web Site 被引用文献4件 参考文献12件
  • Watamori Michio
    Department of Electronic Engineering, Faculty of Engineering, Osaka University, 2–1 Yamadaoka, Suita, Osaka 565
  • Shoji Fumiya
    Department of Electronic Engineering, Faculty of Engineering, Osaka University, 2–1 Yamadaoka, Suita, Osaka 565
  • Oura Kenjiro
    Department of Electronic Engineering, Faculty of Engineering, Osaka University, 2–1 Yamadaoka, Suita, Osaka 565

書誌事項

タイトル別名
  • Methodology for Accurate Oxygen Distribution Analysis and Its Application to YBa2Cu3Ox Thin Films Using 16O(α, α)16O 3.045 MeV Resonance Reaction

この論文をさがす

抄録

The enhancement factor of oxygen of 16O(α, α)16O resonance for a Rutherford backscattering cross section has been investigated using SiO2 films of various thicknesses. A new procedure to accurately extract the resonant oxygen height from a raw spectrum has been proposed. With this procedure, the dependence between the film thicknesses and resonant signals has been investigated, and was found to agree well with a computer simulation within experimental error. Using the enhancement factor, the depth dependence of oxygen concentration in the YBa2Cu3O x/MgO systems has been estimated accurately. Estimations of the accuracy of elastic backscattering analysis are also given.

収録刊行物

被引用文献 (4)*注記

もっと見る

参考文献 (12)*注記

もっと見る

キーワード

詳細情報 詳細情報について

問題の指摘

ページトップへ