Low-Temperature Processing of Highly Oriented Pb(Zr<sub>X</sub>Ti<sub>1-X</sub>)O<sub>3</sub> Thin Film with Multi-Seeding Layers
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- Suzuki Hisao
- Department of Materials Science and Technology, Shizuoka University, Johoku, Hamamatsu 432, Japan
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- Kaneko Shoji
- Department of Materials Science and Technology, Shizuoka University, Johoku, Hamamatsu 432, Japan
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- Murakami Kenji
- Research Institute of Electronics, Shizuoka University, Johoku, Hamamatsu 432, Japan
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- Hayashi Takashi
- Department of Materials Science and Ceramic Technology, Shonan Institute of Technology, 1–1–25 Tsujido–Nishikaigan, Fujisawa, Kanagawa 251, Japan
書誌事項
- タイトル別名
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- Low-Temperature Processing of Highly Oriented Pb(ZrXTi1-X)O3 Thin Film with Multi-Seeding Layers.
- Low-Temperature Processing of Highly Or
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抄録
An improved sol-gel process using molecular-designed alkoxide precursor was described for a lead zirconate titanate (PZT) thin film. This method involves the insertion of inter-layer films of a perovskite lead titanate (PT) layer as a transient seeding layer between each PZT layers, which offers nucleation sites to reduce the activation energy for the crystallization, leading to the low processing temperature (hereafter, abbreviated as a multi-seeding process). An intermediate pyrochlore phase developed in the film by annealing at around 400° C in an air, and then was completely converted to a perovskite phase at a low temperature of 450° C. The relative permittivity of the resulting film annealed at 450° C increased with increasing film thickness and reached about 350 at 1.9 µ m. In addition, highly oriented PZT film was obtained by annealing at 500° C for 2 hours in an air. This highly oriented film exhibited high relative permittivity of about 500 due to its microstructure. As a result, it was demonstrated that multi-seeding process was desirable for obtaining a single phase perovskite PZT film at low temperatures.
収録刊行物
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- Japanese Journal of Applied Physics
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Japanese Journal of Applied Physics 36 (9B), 5803-5807, 1997
The Japan Society of Applied Physics
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詳細情報 詳細情報について
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- CRID
- 1390001206250168704
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- NII論文ID
- 110003947159
- 30021829730
- 210000041748
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- NII書誌ID
- AA10457675
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- COI
- 1:CAS:528:DyaK2sXmvFKisr4%3D
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- ISSN
- 13474065
- 00214922
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- NDL書誌ID
- 4316808
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
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- 使用不可