The copolymer of methyl methacrylate and methacrylic acid as a ansitive resist for deep-etch X-ray lithography
収録刊行物
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- Microsystem Technologies
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Microsystem Technologies 2 46-, 1996
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- CRID
- 1572261551309866880
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- NII論文ID
- 30030268670
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- データソース種別
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- CiNii Articles