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- Ernest E. Huber
- Massachusetts Institute of Technology, Lincoln Laboratory, Lexington, Massachusetts
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- Donald O. Smith
- Massachusetts Institute of Technology, Lincoln Laboratory, Lexington, Massachusetts
抄録
<jats:p>Internal isotropic strain in Permalloy films having a negative magnetoelastic constant creates a magnetoelastic easy axis normal to the film. Below a critical thickness tc such films are single domain in the film plane and have a square B-H loop; above this thickness new configurations are established, characterized by a B-H loop of special form and having relaxation properties. Above tc the Bitter pattern is “mottled” and continues so even in the presence of a 10 000 oe field. A domain structure is proposed in qualitative agreement with experiment; mottling is interpreted in terms of centers of microstrain.</jats:p>
収録刊行物
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- Journal of Applied Physics
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Journal of Applied Physics 30 (4), S267-S269, 1959-04-01
AIP Publishing
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詳細情報 詳細情報について
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- CRID
- 1362825895420557056
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- NII論文ID
- 30035980243
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- ISSN
- 10897550
- 00218979
- http://id.crossref.org/issn/00218979
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- データソース種別
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- Crossref
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