Growth Rate of Fine Grains Formed by Diffusion Induced Recrystallization in Ni Layer of Cu/Ni/Cu Diffusion Couples
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- Kawanami Yasuhiko
- Department of Materials Science and Engineering, Tokyo Institute of Technology
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- Nakano Masahiko
- Department of Materials Science and Engineering, Tokyo Institute of Technology
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- Kajihara Masanori
- Department of Materials Science and Engineering, Tokyo Institute of Technology
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- Mori Tsutomu
- Department of Materials Science and Engineering, Tokyo Institute of Technology
書誌事項
- タイトル別名
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- Growth Rate of Fine Grains Formed by Di
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Diffusion induced recrystallization (DIR) in the Ni(Cu) system was experimentally studied. The notation Ni(Cu) means that Cu atoms diffuse into a pure Ni or binary Ni–Cu phase. The Cu/Ni/Cu diffusion couples consisting of pure Cu single crystals with the same crystallographic orientation and a pure Ni polycrystalline specimen were annealed at 923 and 1023 K for various times between 1.8×103 and 1.76×105 s. The penetration of Cu in the Ni phase was found to occur at rates three orders of magnitude greater than the ones evaluated from the volume diffusion. This unusually rapid penetration is due to DIR. DIR was observed to take place only in the Ni phase from the interfaces in all the diffusion couples annealed at 923 and 1023 K. The observations indicate that the thickness l of the DIR region increases with increasing annealing time t according to the relationships l=4.9×10−8(t⁄t0)0.41 and l=1.8×10−7(t⁄t0)0.37 at 923 and 1023 K, respectively. Here, l and t are measured in m and s, respectively, and t0 is unit time, 1 s. The analysis using the kinetic equation proposed by Li and Hillert could account for the observations quantitatively.
収録刊行物
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- Materials Transactions, JIM
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Materials Transactions, JIM 39 (1), 218-224, 1998
社団法人 日本金属学会
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詳細情報 詳細情報について
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- CRID
- 1390282679223541888
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- NII論文ID
- 130003422517
- 40005337907
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- NII書誌ID
- AA10699969
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- COI
- 1:CAS:528:DyaK1cXitFeqsrw%3D
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- ISSN
- 2432471X
- 09161821
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- NDL書誌ID
- 4406280
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- 本文言語コード
- en
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- データソース種別
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- JaLC
- NDL
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- 使用不可