High Performance Chemically Amplified Positive Electron-Beam Resist: Optimization of Base Additives for Environmental Stabilization.

• SAITO SATOSHI

  Toshiba Corp., Materials&Devices Research Labs.

• KIHARA NAOKO

  Toshiba Corp., Materials&Devices Research Labs.

• NAITO TAKUYA

  Toshiba Corp., Materials&Devices Research Labs.

• NAKASE MAKOTO

  Toshiba Corp., Materials&Devices Research Labs.

• NAKASUGI TETSURO

  Toshiba Corp., ULSI Process Eng. Labs.

• KATO YOSHIMITSU

  Toshiba Corp., ULSI Process Eng. Labs.

書誌事項

タイトル別名

• High Performance Chemically Amplified P
• OPTIMIZATION OF BASE ADDITIVES FOR ENVIRONMENTAL STABILIZATION

抄録

The effects of base additives in chemically amplified positive electron-beam (EB) resist are discussed. The amine additives can improve the resolution of the resist by preventing diffusion of acids outside the exposed area. As a result, 0.1-μm L/S patterns can be obtained, successfully. Additionally, the amine additives can also improve the environmental stability. However, it was demonstrated that the influence on environmental stability differs depending on the chemical structure of amine. The phenomenon is attributable to the process of a proton-base reaction which is investigated by semi-empirical molecular orbital calculation.

収録刊行物

• Journal of Photopolymer Science and Technology

  Journal of Photopolymer Science and Technology 9 (4), 677-684, 1996

  フォトポリマー学会

キーワード

• Materials Chemistry
• Organic Chemistry
• Polymers and Plastics

詳細情報

• CRID: 1390282679302186368
• NII論文ID: 130003489019
• NII論文ID: 40005351740
• NII書誌ID: AA11576862
• DOI: 10.2494/photopolymer.9.677
• COI: 1:CAS:528:DyaK28XksVais7g%3D
• ISSN: 13496336
• ISSN: 09149244
• ISSN: http://id.crossref.org/issn/09149244
• NDL書誌ID: 4142726
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I4142726
• Web Site: http://www.jstage.jst.go.jp/article/photopolymer1988/9/4/9_4_677/_pdf
• 本文言語コード: en
• データソース種別:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles
• 抄録ライセンスフラグ: 使用不可