Photocrosslinking of Oligomers Bearing Glycidyl Sulfonate Ester Units and Their Redissolution Property

• Ohba Tadahiro

  Department of Applied Chemistry, Graduate School of Engineering, Osaka Prefecture University

• Suyama Kanji

  Department of Applied Chemistry, Graduate School of Engineering, Osaka Prefecture University

• Shirai Masamitwsu

  Department of Applied Chemistry, Graduate School of Engineering, Osaka Prefecture University

収録刊行物

• Journal of Photopolymer Science and Technology

  Journal of Photopolymer Science and Technology 19 (6), 709-712, 2006

  フォトポリマー学会

キーワード

• epoxy group
• photocrosslinking
• sulfonate ester
• redissolution
• sulfonic acid
• photolysis

詳細情報

• CRID: 1390282679301036672
• NII論文ID: 130004464510
• NII論文ID: 40015197508
• NII書誌ID: AA11576862
• DOI: 10.2494/photopolymer.19.709
• ISSN: 13496336
• ISSN: 09149244
• NDL書誌ID: 8586182
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I8586182
• Web Site: http://www.jstage.jst.go.jp/article/photopolymer/19/6/19_6_709/_pdf
• 本文言語コード: en
• データソース種別:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles