Preparation of Replicated Resin Mold for UV Nanoimprint Using Reworkable Dimethacrylate

• Matsukawa Daisuke

  Department of Applied Chemistry, Osaka Prefecture University

• Okamura Haruyuki

  Department of Applied Chemistry, Osaka Prefecture University

• Shirai Masamitsu

  Department of Applied Chemistry, Osaka Prefecture University

抄録

Reworkable dimethacrylate which has adamantyl moiety and hemiacetal ester moiety in a molecule was synthesized. UV curing and photo-induced degradation of the UV cured resins were investigated. On UV irradiation at 365 nm, dimethacrylate containing 2,2-dimethoxy-2-phenylacetophenone and di(4-tert-butylphenyl)iodonium triflate became insoluble in methanol. The UV cured resin degraded under acidic conditions. Present resins were applied to UV nanoimprint lithography (UV-NIL) using 365 nm-light and fine line/space patterns on quartz plate were obtained. These patterns (primary patterns) were used as a mold for making a replicated resin mold. By using the primary patterns as a mold, multifunctional acrylates were UV imprinted on Si substrate. After acids were generated in the primary patterns by baking or UV exposure at 254 nm, the sample was dipped in methanol to remove the primary patterns and a replicated resin mold was obtained on Si substrate. UV-NIL using the replicated mold was successfully accomplished.

収録刊行物

• Journal of Photopolymer Science and Technology

  Journal of Photopolymer Science and Technology 23 (6), 781-787, 2010

  フォトポリマー学会

キーワード

• UV imprint
• replica mold
• reworkable resin
• hemiacetal ester

詳細情報

• CRID: 1390282679302883072
• NII論文ID: 130004833379
• NII論文ID: 40017411498
• NII書誌ID: AA11576862
• DOI: 10.2494/photopolymer.23.781
• ISSN: 13496336
• ISSN: 09149244
• NDL書誌ID: 10923350
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I10923350
• Web Site: http://www.jstage.jst.go.jp/article/photopolymer/23/6/23_6_781/_pdf
• 本文言語コード: en
• データソース種別:
  • JaLC
  • NDL
  • Crossref
  • CiNii Articles
• 抄録ライセンスフラグ: 使用不可