Development of Direct Deep Reactive Ion Etching Process Using Laser Interference Lithographed Etch Barrier without Intermediate Layer

• Soonkyu Je

• Jongmyeong Shim

• Joongeok Kim

Bibliographic Information

Other Title

• Special Issue : Electronic Materials and Nanotechnology for Green Environment

Journal

• Japanese journal of applied physics : JJAP

  Japanese journal of applied physics : JJAP 52 (10), 2013-10

  Tokyo : The Japan Society of Applied Physics

Details

• CRID: 1520290882016422400
• NII Article ID: 40019841288
• NII Book ID: AA12295836
• ISSN: 00214922
• NDL BIB ID: 024955129
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I024955129
• Text Lang: en
• NDL Source Classification:
  • ZM35(科学技術--物理学)
• Data Source:
  • NDL
  • CiNii Articles