Effect of Duty Cycle on Characteristics of CrNx Thin Films Deposited by Pulsed Direct Current Reactive Magnetron Sputtering

• Chi-Lung Chang

• Bo-Yi Wu

• Pin-Hung Chen

書誌事項

タイトル別名

• Special Issue : Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials

収録刊行物

• Japanese journal of applied physics : JJAP

  Japanese journal of applied physics : JJAP 52 (11), 2013-11

  Tokyo : The Japan Society of Applied Physics

詳細情報

• CRID: 1520290884247397760
• NII論文ID: 40019883847
• NII書誌ID: AA12295836
• ISSN: 00214922
• NDL書誌ID: 025034122
• Web Site: http://id.ndl.go.jp/bib/025034122
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I025034122
• 本文言語コード: en
• NDL 雑誌分類:
  • ZM35(科学技術--物理学)
• データソース種別:
  • NDL
  • CiNii Articles