Infrared Absorption Films Developed by Copper Electroplating with Chemical Etching and Subsequent Blackening

• ARAKAWA Tomiyuki

  Institute of Science and Technology, Kanto Gakuin University

• WATANABE Nobuaki

  Institute of Science and Technology, Kanto Gakuin University

• OSHIKIRI Junki

  Graduate School of Engineering, Kanto Gakuin University

• KOIWA Ichiro

  Graduate School of Engineering, Kanto Gakuin University

抄録

High infrared-absorption films having low cost and light weight are indispensable for infrared sensors. We developed IR-adsorption coatings with low-reflectance and low-transmittance at wavelengths of 3–13 µm, based on a copper electroplating film pretreated with chemical etching and subsequent blackening. The chemical etching and blackening respectively produced columnar and feather-shaped structures on a copper surface. The reflectance and the transmittance of the films were below 15% and below 1% at wavelengths of 3–13 µm, respectively. The current coating technique might be useful to develop high absorption, low cost, and lightweight infrared absorbers.

収録刊行物

• Electrochemistry

  Electrochemistry 82 (9), 752-754, 2014

  公益社団法人　電気化学会

キーワード

• Cu Electroplating
• Electroless Ni-P Plating
• Black Film
• Infrared Absorber

詳細情報

• CRID: 1390282681476626816
• NII論文ID: 130004688669
• NII書誌ID: AN00151637
• DOI: 10.5796/electrochemistry.82.752
• COI: 1:CAS:528:DC%2BC2cXhsFymsLrK
• ISSN: 21862451
• ISSN: 13443542
• NDL書誌ID: 025750693
• Web Site: https://ndlsearch.ndl.go.jp/books/R000000004-I025750693
• Web Site: https://www.jstage.jst.go.jp/article/electrochemistry/82/9/82_14-E00045/_pdf
• 本文言語コード: en
• データソース種別:
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  • NDL
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• 抄録ライセンスフラグ: 使用可