Study on physical-chemical interactions between plasma and solid surface for thin film processings 薄膜形成プロセッシングにおけるプラズマと表面との物理化学的相互作用に関する研究

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著者

    • 山本, 憲治 ヤマモト, ケンジ

書誌事項

タイトル

Study on physical-chemical interactions between plasma and solid surface for thin film processings

タイトル別名

薄膜形成プロセッシングにおけるプラズマと表面との物理化学的相互作用に関する研究

著者名

山本, 憲治

著者別名

ヤマモト, ケンジ

学位授与大学

京都大学

取得学位

工学博士

学位授与番号

乙第7488号

学位授与年月日

1991-03-23

注記・抄録

博士論文

目次

  1. 論文目録 / (0001.jp2)
  2. Table of Contents / p5 (0006.jp2)
  3. Abstract / p1 (0004.jp2)
  4. Acknowledgements / p3 (0005.jp2)
  5. Chapter 1 Introduction / p1 (0008.jp2)
  6. 1.1 General introduction / p1 (0008.jp2)
  7. 1.2 Plasma Chemical vapor deposition / p4 (0009.jp2)
  8. 1.3 Electron Cyclotron Resonance(ECR) plasma / p5 (0010.jp2)
  9. 1.4 References / p6 (0010.jp2)
  10. Chapter 2 Physical properties and structure of a-SiC:H thin films prepared by Plasma Chemical Vapor Deposition. / p8 (0011.jp2)
  11. 2.1 Abstract / p8 (0011.jp2)
  12. 2.2 Introduction / p8 (0011.jp2)
  13. 2.3 Experimental procedure / p9 (0012.jp2)
  14. 2.4 Results and discussion / p11 (0013.jp2)
  15. 2.5 Conclusion / p23 (0019.jp2)
  16. 2.6 References / p26 (0020.jp2)
  17. Chapter 3 Deposition kinetics and Characterization of a-C:H thin films prepared by Plasma Chemical Vapor Deposition-Relationship between carbon atom coordination and plasma parameter- / p28 (0021.jp2)
  18. 3.1 Abstract / p28 (0021.jp2)
  19. 3.2 Introduction / p28 (0021.jp2)
  20. 3.3 Experimental / p30 (0022.jp2)
  21. 3.4 Results and discussion / p31 (0023.jp2)
  22. 3.5 Conclusion / p49 (0032.jp2)
  23. 3.6 References / p50 (0032.jp2)
  24. Chapter 4 Characterization of small compact Molecular Beam Epitaxy(MBE)compatible Electron Cyclotron Resonance(ECR)plasma source and its application to the oxygen content of YBaCuO thin films / p52 (0033.jp2)
  25. 4.1 Abstract / p52 (0033.jp2)
  26. 4.2 Introduction / p52 (0033.jp2)
  27. 4.3 Experiment / p53 (0034.jp2)
  28. 4.4 Results and discussion / p55 (0035.jp2)
  29. 4.5 Conclusion / p70 (0042.jp2)
  30. 4.6 References / p70 (0042.jp2)
  31. Chapter 5 Role of atomic oxygen produced by ECR plasma in the oxidation of YBaCuO thin films studied by in-situ resistivity measurement. / p72 (0043.jp2)
  32. 5.1 Abstract / p72 (0043.jp2)
  33. 5.2 Introduction / p73 (0044.jp2)
  34. 5.3 Experiment / p73 (0044.jp2)
  35. 5.4 Results and discussion / p74 (0044.jp2)
  36. 5.5 Conclusion / p87 (0051.jp2)
  37. 5.6 References / p87 (0051.jp2)
  38. Appendix 1.Equilibrium properties(relationship between conductance and oxygen content) / p89 (0052.jp2)
  39. Appendix 2.Diffusion model / p94 (0054.jp2)
  40. Chapter 6 Plasma Diagnostics of Off-axis Magnetron Sputtering of YBa₂Cu₃O₇-X Target;The relationship between negative ion formation and target self-bias voltage / p97 (0056.jp2)
  41. 6.1 Abstract / p97 (0056.jp2)
  42. 6.2 Introduction / p97 (0056.jp2)
  43. 6.3 Experiment / p98 (0056.jp2)
  44. 6.4 Results and discussion / p100 (0057.jp2)
  45. 6.5 References / p105 (0060.jp2)
  46. Chapter 7 General conculusion / p106 (0060.jp2)
  47. 7.1 General conclusion / p106 (0060.jp2)
  48. 7.2 Publications by the Author and Collaborators during the course of this research / p109 (0062.jp2)
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各種コード

  • NII論文ID(NAID)
    500000073982
  • NII著者ID(NRID)
    • 8000000074179
  • DOI(NDL)
  • NDL書誌ID
    • 000000238296
  • データ提供元
    • NDL-OPAC
    • NDLデジタルコレクション
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