Nuclear magnetic resonance studies on H and F in amorphous silicon and related materials アモルファスシリコンと関連物質の水素とフッ素の核磁気共鳴
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Bibliographic Information
- Title
-
Nuclear magnetic resonance studies on H and F in amorphous silicon and related materials
- Other Title
-
アモルファスシリコンと関連物質の水素とフッ素の核磁気共鳴
- Author
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上田, 庄一
- Author(Another name)
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ウエダ, ショウイチ
- University
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大阪大学
- Types of degree
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工学博士
- Grant ID
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乙第5289号
- Degree year
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1991-02-26
Note and Description
博士論文
Table of Contents
- Contents / p4 (0006.jp2)
- 1.Introduction / p1 (0007.jp2)
- 2.Experimental Method / p7 (0013.jp2)
- 2.1 Sample Preparation / p7 (0013.jp2)
- 2.2 NMR and ESR Measurements / p7 (0013.jp2)
- 3.F and H NMR in a-Si:(F,H) and a-Si:H / p9 (0015.jp2)
- 3.1 F and H NMR and ESR in a-Si:(F,H) and a-Si:H / p9 (0015.jp2)
- 3.2 Annealing Effects / p14 (0020.jp2)
- 3.3 Motional Narrowing Effect / p19 (0025.jp2)
- 4.Role of Hydrogen and Fluorine / p31 (0037.jp2)
- 5.NMR and IR Studies on Hydrogenated Amorphous [化学式]Films / p39 (0045.jp2)
- 6.H NMR in μc-Si:H / p49 (0055.jp2)
- 7.Conclusion / p56 (0062.jp2)
- References / p57 (0063.jp2)
