Structural imperfections in bulk silica glasses and Si/SiO[2] structures シリカガラス及びSi/SiO[2]構造中の不完全構造
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著者
書誌事項
- タイトル
-
Structural imperfections in bulk silica glasses and Si/SiO[2] structures
- タイトル別名
-
シリカガラス及びSi/SiO[2]構造中の不完全構造
- 著者名
-
粟津, 浩一
- 著者別名
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アワズ, コウイチ
- 学位授与大学
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東京工業大学
- 取得学位
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工学博士
- 学位授与番号
-
甲第2257号
- 学位授与年月日
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1991-03-26
注記・抄録
博士論文
目次
- 論文目録 / (0002.jp2)
- INDEX / p1 (0003.jp2)
- CHAPTER1 INTRODUCTION / p7 (0006.jp2)
- 1.MANUFACTURING PROCESS OF a-SiO₂ MATERIALS / p7 (0006.jp2)
- 2.STRUCTURAL IMPERFECTIONS AND PROPERTIES OF a-SiO₂ MATERIALS / p10 (0008.jp2)
- 3.STRUCTURAL INFORMATIONS ON THE IMPERFECTIONS / p13 (0009.jp2)
- 4.PURPOSE OF THIS THESIS / p16 (0011.jp2)
- REFERENCES / p18 (0012.jp2)
- CHAPTER2 O₂ molecules dissolved in synthetic silica glasses and their photochemical reactions induced by ArF excimer laser radiation / p20 (0013.jp2)
- 1.INTRODUCTION / p20 (0013.jp2)
- 2.EXPERIMENTAL / p22 (0014.jp2)
- 3.RESULTS AND DISCUSSION / p24 (0015.jp2)
- 4.CONCLUSION / p34 (0020.jp2)
- REFERENCES / p36 (0021.jp2)
- CHAPTER3 Simultaneous generation of optical absorption bands at 5.14eV and 0.452eV in 9SiO₂:GeO₂ glasses heated under H₂ ambient / p45 (0025.jp2)
- 1.INTRODUCTION / p45 (0025.jp2)
- 2.EXPERIMENTAL / p47 (0026.jp2)
- 3.RESULTS / p49 (0027.jp2)
- 4.DISCUSSION / p54 (0030.jp2)
- 5.CONCLUSION / p58 (0032.jp2)
- REFERENCES / p59 (0032.jp2)
- CHAPTER4 Optical properties of oxygen deficient centers in silica glasses fabricated in H₂ or vacuum ambient / p66 (0036.jp2)
- 1.INTRODUCTION / p66 (0036.jp2)
- 2.EXPERIMENTAL / p69 (0037.jp2)
- 3.RESULTS / p70 (0038.jp2)
- 4.DISCUSSION / p72 (0039.jp2)
- 5.CONCLUSION / p76 (0041.jp2)
- REFERENCES / p77 (0041.jp2)
- CHAPTER5 Simultaneous generation of the 7.6eV optical absorption band and F₂ molecule in fluorine doped silica glass under annealing / p83 (0044.jp2)
- 1.INTRODUCTION / p83 (0044.jp2)
- 2.EXPERIMENTAL / p85 (0045.jp2)
- 3.RESULTS / p86 (0046.jp2)
- 4.DISCUSSION / p89 (0047.jp2)
- 5.CONCLUSION / p93 (0049.jp2)
- REFERENCES / p95 (0050.jp2)
- CHAPTER6 Characterization of silica glasses sintered under Cl₂ ambient / p102 (0054.jp2)
- 1.INTRODUCTION / p102 (0054.jp2)
- 2.EXPERIMENTAL / p102 (0054.jp2)
- 3.RESULTS / p103 (0054.jp2)
- 4.DISCUSSION / p103 (0054.jp2)
- 5.CONCLUSION / p108 (0057.jp2)
- REFERENCES / p109 (0057.jp2)
- CHAPTER7 Comparison of the electrical states between the ₃O≡SiSi≡O₃ structure in silica glass and disilane molecule with CNDO/2 calculation / p114 (0060.jp2)
- 1.INTRODUCTION / p114 (0060.jp2)
- 2.CALCULATION / p115 (0060.jp2)
- 3.RESULTS & DISCUSSION / p116 (0061.jp2)
- 4.CONCLUSION / p117 (0061.jp2)
- REFERENCES / p118 (0062.jp2)
- CHAPTER8 Structural imperfections in silicon dioxide films determined with VUV optical absorption measurement / p122 (0064.jp2)
- 1.INTRODUCTION / p122 (0064.jp2)
- 2.EXPERIMENTAL / p122 (0064.jp2)
- 3.RESULTS / p123 (0064.jp2)
- 4.DISCUSSION / p123 (0064.jp2)
- 5.CONCLUSION / p127 (0066.jp2)
- REFERENCES / p128 (0067.jp2)
- CHAPTER9 Effects of oxidation conditions on the formation of paramagnetic centers at and near Si/SiO₂ interface / p130 (0068.jp2)
- 1.INTRODUCTION / p130 (0068.jp2)
- 2.EXPERIMENTAL / p132 (0069.jp2)
- 3.RESULTS / p136 (0071.jp2)
- 4.DISCUSSION / p141 (0073.jp2)
- 5.CONCLUSION / p143 (0074.jp2)
- REFERENCES / p145 (0075.jp2)
- CHAPTER10 Summary / p153 (0079.jp2)
- Acknowledgement / p162 (0084.jp2)