Structural imperfections in bulk silica glasses and Si/SiO[2] structures シリカガラス及びSi/SiO[2]構造中の不完全構造

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著者

    • 粟津, 浩一 アワズ, コウイチ

書誌事項

タイトル

Structural imperfections in bulk silica glasses and Si/SiO[2] structures

タイトル別名

シリカガラス及びSi/SiO[2]構造中の不完全構造

著者名

粟津, 浩一

著者別名

アワズ, コウイチ

学位授与大学

東京工業大学

取得学位

工学博士

学位授与番号

甲第2257号

学位授与年月日

1991-03-26

注記・抄録

博士論文

目次

  1. 論文目録 / (0002.jp2)
  2. INDEX / p1 (0003.jp2)
  3. CHAPTER1 INTRODUCTION / p7 (0006.jp2)
  4. 1.MANUFACTURING PROCESS OF a-SiO₂ MATERIALS / p7 (0006.jp2)
  5. 2.STRUCTURAL IMPERFECTIONS AND PROPERTIES OF a-SiO₂ MATERIALS / p10 (0008.jp2)
  6. 3.STRUCTURAL INFORMATIONS ON THE IMPERFECTIONS / p13 (0009.jp2)
  7. 4.PURPOSE OF THIS THESIS / p16 (0011.jp2)
  8. REFERENCES / p18 (0012.jp2)
  9. CHAPTER2 O₂ molecules dissolved in synthetic silica glasses and their photochemical reactions induced by ArF excimer laser radiation / p20 (0013.jp2)
  10. 1.INTRODUCTION / p20 (0013.jp2)
  11. 2.EXPERIMENTAL / p22 (0014.jp2)
  12. 3.RESULTS AND DISCUSSION / p24 (0015.jp2)
  13. 4.CONCLUSION / p34 (0020.jp2)
  14. REFERENCES / p36 (0021.jp2)
  15. CHAPTER3 Simultaneous generation of optical absorption bands at 5.14eV and 0.452eV in 9SiO₂:GeO₂ glasses heated under H₂ ambient / p45 (0025.jp2)
  16. 1.INTRODUCTION / p45 (0025.jp2)
  17. 2.EXPERIMENTAL / p47 (0026.jp2)
  18. 3.RESULTS / p49 (0027.jp2)
  19. 4.DISCUSSION / p54 (0030.jp2)
  20. 5.CONCLUSION / p58 (0032.jp2)
  21. REFERENCES / p59 (0032.jp2)
  22. CHAPTER4 Optical properties of oxygen deficient centers in silica glasses fabricated in H₂ or vacuum ambient / p66 (0036.jp2)
  23. 1.INTRODUCTION / p66 (0036.jp2)
  24. 2.EXPERIMENTAL / p69 (0037.jp2)
  25. 3.RESULTS / p70 (0038.jp2)
  26. 4.DISCUSSION / p72 (0039.jp2)
  27. 5.CONCLUSION / p76 (0041.jp2)
  28. REFERENCES / p77 (0041.jp2)
  29. CHAPTER5 Simultaneous generation of the 7.6eV optical absorption band and F₂ molecule in fluorine doped silica glass under annealing / p83 (0044.jp2)
  30. 1.INTRODUCTION / p83 (0044.jp2)
  31. 2.EXPERIMENTAL / p85 (0045.jp2)
  32. 3.RESULTS / p86 (0046.jp2)
  33. 4.DISCUSSION / p89 (0047.jp2)
  34. 5.CONCLUSION / p93 (0049.jp2)
  35. REFERENCES / p95 (0050.jp2)
  36. CHAPTER6 Characterization of silica glasses sintered under Cl₂ ambient / p102 (0054.jp2)
  37. 1.INTRODUCTION / p102 (0054.jp2)
  38. 2.EXPERIMENTAL / p102 (0054.jp2)
  39. 3.RESULTS / p103 (0054.jp2)
  40. 4.DISCUSSION / p103 (0054.jp2)
  41. 5.CONCLUSION / p108 (0057.jp2)
  42. REFERENCES / p109 (0057.jp2)
  43. CHAPTER7 Comparison of the electrical states between the ₃O≡SiSi≡O₃ structure in silica glass and disilane molecule with CNDO/2 calculation / p114 (0060.jp2)
  44. 1.INTRODUCTION / p114 (0060.jp2)
  45. 2.CALCULATION / p115 (0060.jp2)
  46. 3.RESULTS & DISCUSSION / p116 (0061.jp2)
  47. 4.CONCLUSION / p117 (0061.jp2)
  48. REFERENCES / p118 (0062.jp2)
  49. CHAPTER8 Structural imperfections in silicon dioxide films determined with VUV optical absorption measurement / p122 (0064.jp2)
  50. 1.INTRODUCTION / p122 (0064.jp2)
  51. 2.EXPERIMENTAL / p122 (0064.jp2)
  52. 3.RESULTS / p123 (0064.jp2)
  53. 4.DISCUSSION / p123 (0064.jp2)
  54. 5.CONCLUSION / p127 (0066.jp2)
  55. REFERENCES / p128 (0067.jp2)
  56. CHAPTER9 Effects of oxidation conditions on the formation of paramagnetic centers at and near Si/SiO₂ interface / p130 (0068.jp2)
  57. 1.INTRODUCTION / p130 (0068.jp2)
  58. 2.EXPERIMENTAL / p132 (0069.jp2)
  59. 3.RESULTS / p136 (0071.jp2)
  60. 4.DISCUSSION / p141 (0073.jp2)
  61. 5.CONCLUSION / p143 (0074.jp2)
  62. REFERENCES / p145 (0075.jp2)
  63. CHAPTER10 Summary / p153 (0079.jp2)
  64. Acknowledgement / p162 (0084.jp2)
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各種コード

  • NII論文ID(NAID)
    500000077932
  • NII著者ID(NRID)
    • 8000000078136
  • DOI(NDL)
  • NDL書誌ID
    • 000000242246
  • データ提供元
    • NDL-OPAC
    • NDLデジタルコレクション
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