Ultraviolet-light assisted chemical vapor deposition of Si 紫外線励起シリコン気相成長に関する研究

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Author

    • Motharul Kabir Mazumder モタハル カビル マズンデル

Bibliographic Information

Title

Ultraviolet-light assisted chemical vapor deposition of Si

Other Title

紫外線励起シリコン気相成長に関する研究

Author

Motharul Kabir Mazumder

Author(Another name)

モタハル カビル マズンデル

University

東北大学

Types of degree

工学博士

Grant ID

甲第4491号

Degree year

1991-11-13

Note and Description

博士論文

Table of Contents

  1. INDEX / p1 (0005.jp2)
  2. 1.Introduction / p1 (0010.jp2)
  3. 1.1 Chemical vapor deposition of Si epitaxial films / p1 (0010.jp2)
  4. 1.2 Apparatus for the CVD of Si films / p3 (0012.jp2)
  5. 1.3 Reactant gases of Si-contained compounds / p10 (0019.jp2)
  6. 1.4 Low-temperature process for VLSI / p25 (0034.jp2)
  7. 1.5 Cleaning process / p40 (0049.jp2)
  8. 1.6 Generation of growth defects / p44 (0053.jp2)
  9. 1.7 Purpose and method of the present study / p49 (0058.jp2)
  10. References / p54 (0063.jp2)
  11. 2.Experimental / p67 (0076.jp2)
  12. 2.1 Experimental apparatus / p67 (0076.jp2)
  13. 2.2 Sample preparation / p81 (0090.jp2)
  14. 2.3 Growth process / p86 (0095.jp2)
  15. 2.4 Observation of growth defect / p89 (0098.jp2)
  16. 2.5 Measurement of the growth rate / p93 (0102.jp2)
  17. 2.6 Chemical analysis of impurities:Electron Probe Micro analysis / p97 (0106.jp2)
  18. References / p98 (0107.jp2)
  19. 3.Results / p99 (0108.jp2)
  20. 3.1 Generation kinetics of pyramidal hillocks on Si(111) 0º off surfaces / p99 (0108.jp2)
  21. 3.2 Control of pyramidal hillocks / p132 (0141.jp2)
  22. 3.3 Effect of the UV-light irradiated hydrogen carrier gas on Si epitaxial growth / p150 (0159.jp2)
  23. 3.4 Origin and mechanism of the UV-light irradiation effect / p176 (0185.jp2)
  24. References / p205 (0214.jp2)
  25. 4.Discussion / p208 (0217.jp2)
  26. 4.1 Generation mechanism of growth defects on Si(lll) / p208 (0217.jp2)
  27. 4.2 Suppression of growth defect generation: I.No UV-light irradiation / p263 (0272.jp2)
  28. 4.3 Suppression of growth defect generation:II.UV-light irradiated hydrogen / p274 (0283.jp2)
  29. 4.4 Comparison to other photo-CVD methods / p311 (0320.jp2)
  30. References / p316 (0325.jp2)
  31. 5.Conclusion / p322 (0331.jp2)
  32. Acknowledgments / p330 (0339.jp2)
7access

Codes

  • NII Article ID (NAID)
    500000082707
  • NII Author ID (NRID)
    • 8000000082916
  • DOI(NDL)
  • NDLBibID
    • 000000247021
  • Source
    • NDL ONLINE
    • NDL Digital Collections

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