Formation and characterization of nitride films (TiN, ZrN) deposited by reactively RF sputtering RF反応性スパッタ法による窒化物膜(TiN,ZrN)の形成とキャラクタリゼーション

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Author

    • 金, 平 チン, ピン

Bibliographic Information

Title

Formation and characterization of nitride films (TiN, ZrN) deposited by reactively RF sputtering

Other Title

RF反応性スパッタ法による窒化物膜(TiN,ZrN)の形成とキャラクタリゼーション

Author

金, 平

Author(Another name)

チン, ピン

University

名古屋工業大学

Types of degree

工学博士

Grant ID

甲第85号

Degree year

1992-03-23

Note and Description

博士論文

Table of Contents

  1. Contents / (0003.jp2)
  2. I.General Introduction / p1 (0004.jp2)
  3. II.Internal Stress in Reactively Bias-Sputtered TiN Films / p6 (0007.jp2)
  4. 2.1.Introduction / p6 (0007.jp2)
  5. 2.2.Experimental / p6 (0007.jp2)
  6. 2.3.Results and Discussion / p10 (0009.jp2)
  7. 2.4.Conclusions / p18 (0013.jp2)
  8. References / p18 (0013.jp2)
  9. III.Stress Relaxation in Reactively Bias-Sputtered TiOxNy Films / p20 (0014.jp2)
  10. 3.1.Introduction / p20 (0014.jp2)
  11. 3.2.Experimental / p21 (0014.jp2)
  12. 3.3.Results and Discussion / p22 (0015.jp2)
  13. 3.4.Conclusions / p34 (0021.jp2)
  14. References / p34 (0021.jp2)
  15. IV.Bias Effect on Microstructure and Diffusion Barrier Capability of Reactively Sputtered TiN and TiOxNy Films / p36 (0022.jp2)
  16. 4.1.Introduction / p36 (0022.jp2)
  17. 4.2.Experimental / p36 (0022.jp2)
  18. 4.3.Results / p37 (0022.jp2)
  19. 4.4.Discussion / p47 (0027.jp2)
  20. 4.5.Conclusions / p48 (0028.jp2)
  21. References / p49 (0028.jp2)
  22. V.Formation and Characterization of Reactively Sputtered ZrN Films / p50 (0029.jp2)
  23. 5.1.Introduction / p50 (0029.jp2)
  24. 5.2.Experimental / p50 (0029.jp2)
  25. 5.3.Results and Disscusion / p52 (0030.jp2)
  26. 5.4.Conclusions / p67 (0037.jp2)
  27. References / p68 (0038.jp2)
  28. VI.Internal Stress in Reactively Sputtered ZrN Films / p70 (0039.jp2)
  29. 6.1.Introduction / p70 (0039.jp2)
  30. 6.2.Experimental / p70 (0039.jp2)
  31. 6.3.Results and Discussion / p71 (0039.jp2)
  32. 6.4.Conclusions / p82 (0045.jp2)
  33. References / p82 (0045.jp2)
  34. VII.Bias Effect on Microstructure of Reactively Sputtered ZrN Films / p84 (0046.jp2)
  35. 7.1.Introduction / p84 (0046.jp2)
  36. 7.2.Experimental / p85 (0046.jp2)
  37. 7.3.Results / p86 (0047.jp2)
  38. 7.4.Discussion / p94 (0051.jp2)
  39. 7.5.Conclusions / p98 (0053.jp2)
  40. References / p99 (0053.jp2)
  41. VIII.Summary / p100 (0054.jp2)
  42. Acknowledgements / p104 (0056.jp2)
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Codes

  • NII Article ID (NAID)
    500000083988
  • NII Author ID (NRID)
    • 8000000084198
  • DOI(NDL)
  • NDLBibID
    • 000000248302
  • Source
    • NDL ONLINE
    • NDL Digital Collections

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