Ultraclean dual RF excitation plasma etching system for ULSI ULSI製造用超クリーン二周波励起プラズマエッチング装置

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著者

    • Goto Haruhiro Harry ゴトウ ハルヒロ ハリー

書誌事項

タイトル

Ultraclean dual RF excitation plasma etching system for ULSI

タイトル別名

ULSI製造用超クリーン二周波励起プラズマエッチング装置

著者名

Goto Haruhiro Harry

著者別名

ゴトウ ハルヒロ ハリー

学位授与大学

東北大学

取得学位

工学博士

学位授与番号

乙第5779号

学位授与年月日

1992-03-18

注記・抄録

博士論文

目次

  1. TABLE OF CONTENTS / p4 (0005.jp2)
  2. ABSTRACT / p2 (0003.jp2)
  3. TABLE OF CONTENTS / p4 (0005.jp2)
  4. TABLE OF FIGURES / p6 (0007.jp2)
  5. RELATED PUBLICATIONS AND PATENTS / p10 (0011.jp2)
  6. ACKNOWLEDGEMENTS / p12 (0013.jp2)
  7. CHAPTER I.INTRODUCTION AND REVIEW / p1 (0014.jp2)
  8. 1.Background of Present Studies / p1 (0014.jp2)
  9. 2.Objectives of Present Studies / p5 (0018.jp2)
  10. References / p7 (0020.jp2)
  11. CHAPTER II.SUPPRESSION OF CHAMBER MATERIAL CONTAMINATION UTILIZING ENERGY CLEAN TECHNOLOGY / p10 (0023.jp2)
  12. 1.Experimental System Design / p10 (0023.jp2)
  13. 2.Plasma Impedance Measurement / p19 (0032.jp2)
  14. 3.Magnetic Field Effects on Plasma Potential Distribution / p23 (0036.jp2)
  15. 4.Effect of DC-biased Shield on Chamber Material Contamination / p33 (0046.jp2)
  16. 5.Conclusion / p42 (0055.jp2)
  17. References / p43 (0056.jp2)
  18. CHAPTER III.INDEPENDENT CONTROL OF ION FLUX AND ION BOMBARDMENT ENERGY / p45 (0058.jp2)
  19. 1.Excitation Frequency Effects on Plasma Parameters / p45 (0058.jp2)
  20. 2.Independent Control of Ion Density and Ion Bombardment Energy in a Dual RF Excitation Plasma / p58 (0071.jp2)
  21. 3.Electrical Separation of Electrodes in a Dual Excitation Discharge / p78 (0091.jp2)
  22. 4.Conclusion / p83 (0096.jp2)
  23. References / p84 (0097.jp2)
  24. CHAPTER IV.LOW ENERGY DUAL EXCITATION REACTIVE ION ETCHING(DERIE) / (0099.jp2)
  25. 1.Low Energy Etching Characterization of Dual Excitation Discharges / p86 (0099.jp2)
  26. 2.Low Energy Wafer Surface Cleaning by DERIE in H₂ and SiF₄ Discharges / p94 (0107.jp2)
  27. 3.Conclusion / p101 (0114.jp2)
  28. References / p102 (0115.jp2)
  29. CHAPTER V.DESIGN CONCEPT OF ULTRACLEAN MAGNETICALLY ENHANCED DERIE / p103 (0116.jp2)
  30. 1.Hardware Related Process Limitations in Advanced Magnetically Enhanced RIE(MERIE) / p103 (0116.jp2)
  31. 2.Design of UC Magnetically Enhanced DERIE / p114 (0127.jp2)
  32. 3.Conclusion / p121 (0134.jp2)
  33. References / p122 (0135.jp2)
  34. CHAPTER VI.CONCLUSIONS OF PRESENT STUDIES / p124 (0137.jp2)
  35. Conclusions / p124 (0137.jp2)
  36. APPENDIX A:Filtering Characteristics of Low-Pass-Filters / p126 (0139.jp2)
  37. APPENDIX B:L-type Matching Network Design Considerations / p128 (0141.jp2)
  38. APPENDIX C:Band-Pass-Fiters Design Calculations / p131 (0144.jp2)
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各種コード

  • NII論文ID(NAID)
    500000085188
  • NII著者ID(NRID)
    • 8000000085402
  • DOI(NDL)
  • NDL書誌ID
    • 000000249502
  • データ提供元
    • NDL-OPAC
    • NDLデジタルコレクション
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