Theoretical studies on structures and reaction mechanisms of some silicon compounds ケイ素化合物の構造と反応機構に関する理論的研究
この論文にアクセスする
この論文をさがす
著者
書誌事項
- タイトル
-
Theoretical studies on structures and reaction mechanisms of some silicon compounds
- タイトル別名
-
ケイ素化合物の構造と反応機構に関する理論的研究
- 著者名
-
黒崎, 譲
- 著者別名
-
クロサキ, ユズル
- 学位授与大学
-
京都大学
- 取得学位
-
工学博士
- 学位授与番号
-
甲第5113号
- 学位授与年月日
-
1992-03-23
注記・抄録
博士論文
目次
- 論文目録 / (0001.jp2)
- CONTENTS / p4 (0007.jp2)
- PREFACE / p1 (0005.jp2)
- CONTENTS / p4 (0007.jp2)
- GENERAL INTRODUCTION / p1 (0008.jp2)
- PART I.REACTION MECHANISMS OF SILICON NITRIDE AND SILICON OXIDE FORMATIONS / (0012.jp2)
- Introduction / p11 (0013.jp2)
- Chapter1.Reaction Ergodography for Silicon Nitride Bond Formation in the Laser-Driven Gas-Phase Reaction / p15 (0015.jp2)
- Chapter2.Direct Reaction Pathways for Silicon Nitride Bond Formation in the Gas Phase of the SiH₄ and NH₃ Mixture / p47 (0031.jp2)
- Chapter3.Reaction Ergodography for Silicon Nitride Bond Formation by the Nitridation of Silicon Dioxide / p75 (0045.jp2)
- Chapter4.Stability of the Reaction Path of Silicon Oxide Bond Formation, SiH₄ + H₂O → staggered-SiH₃OH + H₂ / p97 (0056.jp2)
- PART II.REACTION MECHANISM OF THERMAL ETCHING OF SILICON / (0062.jp2)
- Intoduction / p111 (0063.jp2)
- Chapter1.Local Model Calculation for Fluorination Process in Thermal Etching of Si / p113 (0064.jp2)
- Chapter2.Local Model Calculation for Fluorination Process in Thermal Etching of Si. II. Calculation for a Larger System / p139 (0077.jp2)
- PART III.PHOTOCHEMICAL BEHAVIORS OF SOME DISILANYL-SUBSTITUTED NAPHTHALENES / (0086.jp2)
- Introduction / p159 (0087.jp2)
- Chapter1.Orbital Interactions in the Photolysis of 1,4-and 1,5-Bis(pentamethyldisilanyl)naphthalene and 1- and 2-(pentamethyldisilanyl)naphthalene / p161 (0088.jp2)
- Chapter2.Orbital Interactions in the Photolysis of 2,6-and 2,7-Bis(pentamethyldisilanyl)naphthalene / p181 (0098.jp2)
- GENERAL CONCLUSION / p189 (0102.jp2)
