A study on electrochemically deposited thin films for magnetic devices 電気化学的手法による磁気デバイス用薄膜に関する研究

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著者

    • 本間, 敬之, 1964- ホンマ, タカユキ

書誌事項

タイトル

A study on electrochemically deposited thin films for magnetic devices

タイトル別名

電気化学的手法による磁気デバイス用薄膜に関する研究

著者名

本間, 敬之, 1964-

著者別名

ホンマ, タカユキ

学位授与大学

早稲田大学

取得学位

工学博士

学位授与番号

甲第903号

学位授与年月日

1992-03-15

注記・抄録

博士論文

目次

  1. Contents / (0003.jp2)
  2. Preface / p1 (0006.jp2)
  3. Chapter1.General Introduction / p3 (0007.jp2)
  4. 1.1 Thin Films and Their Electrochemical Formation Processes / p4 (0008.jp2)
  5. 1.2 Magnetic Films and Magnetic Recording / p13 (0012.jp2)
  6. 1.3 Scanning Tunneling Microscopy / p36 (0024.jp2)
  7. References / p45 (0028.jp2)
  8. Chapter2.Development of High Density Magnetic Recording Media and Evaluation of Their Micro-structure-Properties Interrelationships / p62 (0037.jp2)
  9. 2.1 Preparation of Perpendicular Magnetic Recording Media by Electroless-Deposition / p64 (0038.jp2)
  10. 2.2 Microstructure-Magnetics Interrelationships for CoNiReP Films / p76 (0044.jp2)
  11. 2.3 Microstructural Study of CoNiP Films / p101 (0057.jp2)
  12. References / p123 (0068.jp2)
  13. Chapter3.Recording Characteristics of Electroless Deposited Media / p126 (0069.jp2)
  14. 3.1 Phase Synchronization Effect / p128 (0070.jp2)
  15. 3.2 Various Parameters Affecting on Recording Characteristics / p138 (0075.jp2)
  16. References / p153 (0083.jp2)
  17. Chapter4.Development of Soft Magnetic Films by Electroless-Deposition / p154 (0083.jp2)
  18. 4.1 Preparation of CoB Soft Magnetic Films / p156 (0084.jp2)
  19. 4.2 Improvement of Soft Magnetic Properties of the CoB Films / p165 (0089.jp2)
  20. References / p173 (0093.jp2)
  21. Chapter5.Control of Film Properties by Initial Deposition Condition / p175 (0094.jp2)
  22. 5.1 Initial Growth Process of Electroless-Deposited Films / p177 (0095.jp2)
  23. 5.2 Microstructural Control of CoNiReP Films by Underlayer / p190 (0102.jp2)
  24. 5.3 Property Control of CoP Thin Film Media by Substrate Texturizing / p200 (0107.jp2)
  25. References / p210 (0112.jp2)
  26. Chapter6.In situ Scanning Tunneling Microscopy Study of Initial Deposition Process / p213 (0113.jp2)
  27. 6.1 Ex Situ STM Observation of Electroless-Deposited Films / p215 (0114.jp2)
  28. 6.2 In Situ Study of Electroless-Deposition Process / p220 (0117.jp2)
  29. References / p235 (0124.jp2)
  30. Chapter7.General Conclusions / p237 (0125.jp2)
  31. List of Achievements / p244 (0129.jp2)
  32. Acknowledgments / p256 (0135.jp2)
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各種コード

  • NII論文ID(NAID)
    500000086598
  • NII著者ID(NRID)
    • 8000000979060
  • DOI(NDL)
  • 本文言語コード
    • eng
  • NDL書誌ID
    • 000000250912
  • データ提供元
    • 機関リポジトリ
    • NDL-OPAC
    • NDLデジタルコレクション
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