Design and development of high performance positive photoresists 高性能ポジ型フォトレジストの設計と開発

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Contents / p1 (0003.jp2)
Introduction / p2 (0004.jp2)
Chapter1.Influence of Various Factors of Novolak Resins on Performance of Positive Photoresist. / p8 (0007.jp2)
1-1.Introduction / p9 (0008.jp2)
1-2.Experimental / p14 (0010.jp2)
1-3.Results and Discussion / p22 (0014.jp2)
1-4.Summary / p50 (0028.jp2)
1-5.References / p54 (0030.jp2)
Chapter2.A Selection Principle of Phenolic Compounds for Novolak Resins in High Performance Positive Photoresist. / p56 (0031.jp2)
2-1.Introduction / p57 (0032.jp2)
2-2.Experimental / p59 (0033.jp2)
2-3.Results and Discussion / p62 (0034.jp2)
2-4.Summary / p83 (0045.jp2)
2-5.References / p84 (0045.jp2)
Chapter3.Dissolution Inhibition Mechanism for Image Formation in Novolak-based Positive Photoresist. / p85 (0046.jp2)
3-1.Introduction / p86 (0046.jp2)
3-2.Experimental / p87 (0047.jp2)
3-3.Results and Discussion / p89 (0048.jp2)
3-4.Summary / p99 (0053.jp2)
3-5.References / p100 (0053.jp2)
Chapter4.Design and Development of High Performance Positive Photoresist . / p101 (0054.jp2)
4-1.Introduction / p102 (0054.jp2)
4-2.Experimental / p105 (0056.jp2)
4-3.Results and Discussion / p111 (0059.jp2)
4-4.Summary / p131 (0069.jp2)
4-5.References / p132 (0069.jp2)
Conclusion / p133 (0070.jp2)
Acknowlegements / p136 (0071.jp2)
List of Publications / p137 (0072.jp2)

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