Spectroscopic studies on the excited states of phenylsilane and its photolysis products フェニルシラン及びその光解離生成物の励起状態に関する分光学的研究
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Bibliographic Information
- Title
-
Spectroscopic studies on the excited states of phenylsilane and its photolysis products
- Other Title
-
フェニルシラン及びその光解離生成物の励起状態に関する分光学的研究
- Author
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石川, 春樹
- Author(Another name)
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イシカワ, ハルキ
- University
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京都大学
- Types of degree
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博士 (理学)
- Grant ID
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甲第5275号
- Degree year
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1993-03-23
Note and Description
博士論文
Table of Contents
- 論文目録 / (0001.jp2)
- Acknowledgement / p1 (0004.jp2)
- Contents / p2 (0005.jp2)
- I.Introduction / I-1 / (0006.jp2)
- References / I-5 / (0008.jp2)
- II.Electronic Interactions between the Silyl Group and the π-system in the Excited State of Phenylsilane / II-1 / (0009.jp2)
- II-1.Introduction / II-1 / (0009.jp2)
- II-2.Spectroscopic Analysis of the Internal Rotation / II-4 / (0010.jp2)
- II-3.Ab initio MO calculations of phenylsilane / II-11 / (0014.jp2)
- II-4.Summary / II-16 / (0016.jp2)
- II-A.Appendix / II-39 / (0028.jp2)
- III.The 193nm Photolysis of Phenylsilane:The Energy Distribution of the Fragments / III-1 / (0038.jp2)
- III-1.Introduction / III-1 / (0038.jp2)
- III-2.Experimental / III-3 / (0039.jp2)
- III-3.Results and Discussion / III-4 / (0040.jp2)
- III-4.Summary / III-9 / (0042.jp2)
- IV.Spectroscopic Studies on Fragments of the 193 nm Photolysis of Phenylsilane / IV-1 / (0048.jp2)
- IV-1.Fermi Resonance in the X state and Vibrational Analysis of SiH₂(X¹A₁ and A¹B₁) / IV-1 / (0048.jp2)
- IV-2.Formationand Decay of SiC₂ Produced on the 193nm Photolysis of Phenylsilane / IV-35 / (0065.jp2)