Studies on photoacid generation from aromatic sulfonates : mechanistic investigation and application to resist materials 芳香族スルホネート類からの光酸発生に関する研究 : 反応機構の研究とレジスト材料への応用

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著者

    • 内藤, 和彦 ナイトウ, カズヒコ

書誌事項

タイトル

Studies on photoacid generation from aromatic sulfonates : mechanistic investigation and application to resist materials

タイトル別名

芳香族スルホネート類からの光酸発生に関する研究 : 反応機構の研究とレジスト材料への応用

著者名

内藤, 和彦

著者別名

ナイトウ, カズヒコ

学位授与大学

千葉大学

取得学位

博士 (工学)

学位授与番号

甲第989号

学位授与年月日

1993-03-25

注記・抄録

博士論文

目次

  1. Contents / (0004.jp2)
  2. Chapter 1 General Introduction / p1 (0007.jp2)
  3. References / p17 (0023.jp2)
  4. Chapter 2 Photoinduced Intramolecular Electron Trasnfer Mechanism for Photochemical Dissociation of Para-Substituted Benzyl 9,10-Dimethoxyanthracene-2-sulfonates / p19 (0025.jp2)
  5. Abstract / p19 (0025.jp2)
  6. Introduction / p21 (0027.jp2)
  7. Experimental Section / p23 (0029.jp2)
  8. Results and Discussion / p29 (0035.jp2)
  9. Conclusions / p46 (0052.jp2)
  10. References and Notes / p47 (0053.jp2)
  11. Chapter 3 Photochemical Dissociation of p-Nitrobenzyl Sulfonates Esters via an Intramolecular Electron Transfer / p51 (0057.jp2)
  12. Abstract / p51 (0057.jp2)
  13. Introduction / p53 (0059.jp2)
  14. Results and Discussion / p55 (0061.jp2)
  15. Conclusions / p72 (0078.jp2)
  16. Experimentals / p73 (0079.jp2)
  17. References and Notes / p77 (0083.jp2)
  18. Chapter 4 Intra-ion-pair Electron Transfer Mechanism for Photolysis of Diphenyliodonium Salt Sensitized by 9,10-Dimethoxyanthracene-2-sulfonate Counteranion / p79 (0085.jp2)
  19. Abstract / p79 (0085.jp2)
  20. Introduction / p80 (0086.jp2)
  21. Results and Discussion / p81 (0087.jp2)
  22. Conclusions / p87 (0093.jp2)
  23. Experimental Section / p88 (0094.jp2)
  24. References and Notes / p90 (0096.jp2)
  25. Chapter 5 Acid Generation and Deprotecting Reaction by Diphenyliodonium 9,10-Dimethoxyanthracene-2-sulfonate in a Novolak Positive Photoresist Based on Chemical Amplification / p92 (0098.jp2)
  26. Abstract / p92 (0098.jp2)
  27. Introduction / p93 (0099.jp2)
  28. Experimentals / p95 (0101.jp2)
  29. Results and Discussion / p97 (0103.jp2)
  30. Conclusions / p112 (0118.jp2)
  31. References / p113 (0119.jp2)
  32. Chapter 6 Photoreactive Fluorinated Polyimide Protected by Tetrahydropyranyl (THP) Group Based on Chemical Amplification ‐ Acid Generation in Polyimide Film and Lithographic Properties / p115 (0121.jp2)
  33. Abstract / p115 (0121.jp2)
  34. Introduction / p117 (0123.jp2)
  35. Experimental Section / p119 (0125.jp2)
  36. Results and Discussion / p123 (0129.jp2)
  37. Conclusions / p135 (0141.jp2)
  38. References / p136 (0142.jp2)
  39. Chapter 7 An Aqueous Base Developable Photoresist Based on Light-induced Cationic Polymerization:Resist Performance of Poly(glycidyl methacrylate-co-methacrylic acid) / p138 (0144.jp2)
  40. Abstract / p138 (0144.jp2)
  41. Introduction / p139 (0145.jp2)
  42. Experimentals / p141 (0147.jp2)
  43. Results and Discussion / p144 (0150.jp2)
  44. Conclusions / p156 (0162.jp2)
  45. References / p157 (0163.jp2)
  46. Chapter 8 Conclusions / p159 (0165.jp2)
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各種コード

  • NII論文ID(NAID)
    500000094855
  • NII著者ID(NRID)
    • 8000000095081
  • DOI(NDL)
  • NDL書誌ID
    • 000000259169
  • データ提供元
    • NDL-OPAC
    • NDLデジタルコレクション
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