Photoenhanced effects in chemical vapor deposition and properties of ferroelectric PbZr[x]Ti[1-x]O[3] thin films 強誘電性PbZr[x]Ti[1-x]O[3]薄膜の化学気相成長における光励起効果と特性

この論文にアクセスする

この論文をさがす

著者

    • 片山, 琢磨 カタヤマ, タクマ

書誌事項

タイトル

Photoenhanced effects in chemical vapor deposition and properties of ferroelectric PbZr[x]Ti[1-x]O[3] thin films

タイトル別名

強誘電性PbZr[x]Ti[1-x]O[3]薄膜の化学気相成長における光励起効果と特性

著者名

片山, 琢磨

著者別名

カタヤマ, タクマ

学位授与大学

京都大学

取得学位

博士 (工学)

学位授与番号

甲第5799号

学位授与年月日

1994-07-23

注記・抄録

博士論文

目次

  1. 論文目録 / (0001.jp2)
  2. CONTENTS / p5 (0008.jp2)
  3. PREFACE / p1 (0006.jp2)
  4. ACKNOWLEDGEMENTS / p3 (0007.jp2)
  5. I.INTRODUCTION / p1 (0010.jp2)
  6. References / p8 (0014.jp2)
  7. II.PHOTOENHANCED CHEMICAL VAPOR DEPOSITION OF PbTiO₃ THIN FILMS USING OXYGEN / p11 (0015.jp2)
  8. 2-1 Introduction / p11 (0015.jp2)
  9. 2-2 Photo-CVD Apparatus and Experimental Procedure / p12 (0016.jp2)
  10. 2-3 Growth PbO and TiO₂ Thin Films / p16 (0018.jp2)
  11. 2-4 Growth of PbTiO₃ Thin Films / p21 (0020.jp2)
  12. 2-5 Electrical Properties of PbTiO₃ Thin Films / p29 (0024.jp2)
  13. 2-6 Summary / p34 (0027.jp2)
  14. References / p36 (0028.jp2)
  15. III.PHOTOENHANCED CHEMICAL VAPOR DEPOSITION OF PbTiO₃ THIN FILMS USING NITROGEN DIOXIDE / p37 (0028.jp2)
  16. 3-1 Introduction / p37 (0028.jp2)
  17. 3-2 Thermochemical and Photochemical Properties of NO₂ / p37 (0028.jp2)
  18. 3-3 Experimental Procedure / p38 (0029.jp2)
  19. 3-4 Growth of PbTiO₃ Thin Films / p38 (0029.jp2)
  20. 3-5 Electrical Properties of PbTiO₃ Thin Films / p46 (0033.jp2)
  21. 3-6 Summary / p48 (0034.jp2)
  22. References / p50 (0035.jp2)
  23. IV.GROWTH OF [化学式] THIN FILMS BY PHOTOENHANCED CHEMICAL VAPOR DEPOSITION / p51 (0035.jp2)
  24. 4-1 Introduction / p51 (0035.jp2)
  25. 4-2 Photo-CVD Apparatus and Experimental Procedure / p52 (0036.jp2)
  26. 4-3 Growth of PbO,ZrO₂ and TiO₂ Thin Films / p56 (0038.jp2)
  27. 4-4 Growth of [化学式] Thin Films Using Oxygen / p59 (0039.jp2)
  28. 4-5 Growth of [化学式] Thin Films Using Nitrogen Dioxide / p74 (0047.jp2)
  29. 4-6 Summary / p79 (0049.jp2)
  30. References / p81 (0050.jp2)
  31. V.ELECTRICAL PROPERTIES OF FERROELECTRIC [化学式] THIN FILMS / p85 (0052.jp2)
  32. 5-1 Introduction / p85 (0052.jp2)
  33. 5-2 Experimental Procedure / p86 (0053.jp2)
  34. 5-3 Dependence on Gas Composition and Substrate Temperature,and Effects of Photoirradiation / p88 (0054.jp2)
  35. 5-4 Dependence on Growth Rate / p97 (0058.jp2)
  36. 5-5 Dependence on Film Thickness / p107 (0063.jp2)
  37. 5-6 Summary / p115 (0067.jp2)
  38. References / p116 (0068.jp2)
  39. VI.POLARIZATION SWITCHING IN FERROELECTRIC [化学式] THIN FILMS / p117 (0068.jp2)
  40. 6-1 Introduction / p117 (0068.jp2)
  41. 6-2 Experimental Procedure / p118 (0069.jp2)
  42. 6-3 Switching Kinetics of [化学式] Thin Films / p121 (0070.jp2)
  43. 6-4 Dependence of Switching Characteristics on CVD Growth Parameters / p133 (0076.jp2)
  44. 6-5 Summary / p140 (0080.jp2)
  45. References / p142 (0081.jp2)
  46. VII.CONCLUSIONS / p145 (0082.jp2)
  47. LIST OF PUBLICATIONS / p149 (0084.jp2)
6アクセス

各種コード

  • NII論文ID(NAID)
    500000110566
  • NII著者ID(NRID)
    • 8000000110813
  • DOI(NDL)
  • NDL書誌ID
    • 000000274880
  • データ提供元
    • NDL ONLINE
    • NDLデジタルコレクション

書き出し

ページトップへ