Synthesis from new gas sources and characterization of diamond films 新しい反応ガスによるダイヤモンド薄膜合成及びその特性評価

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著者

    • 陳, 家富 チン, カフ

書誌事項

タイトル

Synthesis from new gas sources and characterization of diamond films

タイトル別名

新しい反応ガスによるダイヤモンド薄膜合成及びその特性評価

著者名

陳, 家富

著者別名

チン, カフ

学位授与大学

大阪大学

取得学位

博士 (工学)

学位授与番号

乙第6878号

学位授与年月日

1996-03-05

注記・抄録

博士論文

12281

博士(工学)

1996-03-05

大阪大学

14401乙第06878号

目次

  1. Contents / p1 (0003.jp2)
  2. Contents / p1 (0003.jp2)
  3. Abstract / p4 (0005.jp2)
  4. Table captions / p8 (0007.jp2)
  5. Figure captions / p9 (0007.jp2)
  6. Chapter1.Introduction 1 / p1 (0011.jp2)
  7. 1.1.Motivation for diamond research / p1 (0011.jp2)
  8. 1.2.The purpose of this research / p4 (0013.jp2)
  9. Chapter2.Literature review / p5 (0013.jp2)
  10. 2.1.Properties and types of diamond / p5 (0013.jp2)
  11. 2.2.Development of vapor growth methods / p5 (0013.jp2)
  12. 2.3.Forms of carbon / p11 (0016.jp2)
  13. 2.4.The role of atomic hydrogen / p11 (0016.jp2)
  14. 2.5.Effects of oxygen on the diamond deposition process / p13 (0017.jp2)
  15. 2.6.Effects of the methane concentration on diamond crystals / p13 (0017.jp2)
  16. 2.7.Effects of substrate temperature on diamond crystals / p14 (0018.jp2)
  17. 2.8.Effects of foreign substrate materials / p14 (0018.jp2)
  18. 2.9.The nucleation and growth mechanism of diamond / p16 (0019.jp2)
  19. 2.10.The methods of diamond phase identification / p18 (0020.jp2)
  20. 2.11.Microstructures of diamond formed by CVD / p23 (0022.jp2)
  21. Chapter3.Experimental procedure / p25 (0023.jp2)
  22. 3.1.Flow chart of experimental procedures / p25 (0023.jp2)
  23. 3.2.Diamond deposition system / p26 (0024.jp2)
  24. 3.3 Substrate pretreatments and deposition conditions / p28 (0025.jp2)
  25. 3.4 Characterization of deposits / p28 (0025.jp2)
  26. 3.5 Current-voltage(I-V)and capacitance-voltage(C-V)measurements / p30 (0026.jp2)
  27. Chapter4.Results and discussion / p31 (0026.jp2)
  28. 4.1.Growth of diamond from CO₂-(CH₄,C₂H₂,C₃H₈)gas systems,without supplying additional hydrogen gas / p31 (0026.jp2)
  29. 4.2.morphologies and deposition rates of diamonds created in the CO₂-(CH₄,C₂H₂,C₃H₈)gas systems / p49 (0037.jp2)
  30. 4.3.Role of hydrogen and oxygen in diamond synthesis using carbon-dioxide-methane-gas mixtures / p59 (0044.jp2)
  31. 4.4.Spectroscopic diagnostics of C-H-O plasma related to diamond deposition / p77 (0056.jp2)
  32. 4.5.Characterization of boron-doped diamond films using(CH₄-CO₂)gas mixtures with B(OCH₃)₃ as a dopant source by MPCVD / p94 (0066.jp2)
  33. 4.6.Electrical properties of boron-doped diamond films after annealing treatment / p108 (0075.jp2)
  34. 4.7.Improvement of selectivity during diamond growth utilizing a new process / p119 (0080.jp2)
  35. Chapter5.Conclusion / p126 (0086.jp2)
  36. References / p132 (0089.jp2)
  37. Acknowledgement / p140 (0093.jp2)
  38. Publication list / p141 (0094.jp2)
  39. Resume / p148 (0097.jp2)
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各種コード

  • NII論文ID(NAID)
    500000130639
  • NII著者ID(NRID)
    • 8000000954387
  • DOI(NDL)
  • NDL書誌ID
    • 000000294953
  • データ提供元
    • 機関リポジトリ
    • NDL-OPAC
    • NDLデジタルコレクション
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