Studies on CF[x] (x=1-3) radicals in RF fluorocarbon etching plasmas RFフルオロカーボンエッチングプラズマ中のCF[x](x=1-3)ラジカルに関する研究
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著者
書誌事項
- タイトル
-
Studies on CF[x] (x=1-3) radicals in RF fluorocarbon etching plasmas
- タイトル別名
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RFフルオロカーボンエッチングプラズマ中のCF[x](x=1-3)ラジカルに関する研究
- 著者名
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丸山, 幸児
- 著者別名
-
マルヤマ, コウジ
- 学位授与大学
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名古屋大学
- 取得学位
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博士 (工学)
- 学位授与番号
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甲第3454号
- 学位授与年月日
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1996-03-25
注記・抄録
博士論文
目次
- Table of Contents / p1 (0003.jp2)
- CHAPTER1.INTRODUCTION / p1 (0005.jp2)
- 1.1 Plasma Etching in Semiconductor Device Fabrications / p1 (0005.jp2)
- 1.2 Problems in Previous Improvement of Plasma Etching / p3 (0006.jp2)
- 1.3 Purpose and Composition of This Thesis / p7 (0008.jp2)
- REFERENCES FOR CHAPTER1 / p9 (0009.jp2)
- CHAPTER2.PRINCIPLES AND PROCEDURES OF PLASMA DIAGNOSTICS / p11 (0010.jp2)
- 2.1 Diagnostic Techniques for Reactive Species in Plasma / p11 (0010.jp2)
- 2.2 Infrared Diode Laser Absorption Spectroscopy (IRLAS) / p12 (0011.jp2)
- 2.3 Optical Emission Spectroscopy(OES)and Actinometry / p34 (0022.jp2)
- REFERENCES FOR CHAPTER2 / p43 (0026.jp2)
- CHAPTER3 MEASUREMENTS OF CFx(x=1-3)RADICAL DENSITIES IN RF FLUOROCARBON PLASMAS / p45 (0027.jp2)
- 3.1 Introduction / p45 (0027.jp2)
- 3.2 Measurements of CF and CF₂ Radical Densities in RF CF₄ Plasma / p45 (0027.jp2)
- 3.3 Measurements of CF,CF₂,and CF₃ Radical Densities in RF CHF₃ Plasma / p55 (0032.jp2)
- 3.4 Summary / p74 (0042.jp2)
- REFERENCES FOR CHAPTER3 / p76 (0043.jp2)
- CHAPTER4.KINETICS OF CFx(x=1-3)RADICALS IN FLUOROCARBON PLASMAS ADDED HYDROGEN AND OXYGEN / p77 (0043.jp2)
- 4.1 Introduction / p77 (0043.jp2)
- 4.2 CF₄/H₂ Plasma / p77 (0043.jp2)
- 4.3 CHF₃/H₂ Plasma / p86 (0048.jp2)
- 4.4 CF₄/O₂ Plasma / p94 (0052.jp2)
- 4.5 CHF₃/O₂ Plasma / p96 (0053.jp2)
- 4.6 Summary / p106 (0058.jp2)
- Appendix / p107 (0058.jp2)
- Estimation of H atom density in RF CF₄/H₂ plasma / p107 (0058.jp2)
- Estimation of H atom density in RF CHF₃/H₂ plasma / p108 (0059.jp2)
- REFERENCES FOR CHAPTER4 / p110 (0060.jp2)
- CHAPTER5.VALIDITY OF CF AND CF₂ ACTINOMETRY IN RF CF₄ AND CF₄/H₂ PLASMAS / p113 (0061.jp2)
- 5.1 Introduction / p113 (0061.jp2)
- 5.2 CF and CF₂ Actinometry in RF CF₄ Plasma / p113 (0061.jp2)
- 5.3 CF and CF₂ Actinometry in RF CF₄/H₂ Plasma / p118 (0064.jp2)
- 5.4 Summary / p122 (0066.jp2)
- REFERENCES FOR CHAPTER5 / p125 (0067.jp2)
- CHAPTER6. CONCLUSIONS / p127 (0068.jp2)
- 6.1 Summary of This Study / p127 (0068.jp2)
- 6.2 Scope for Future Research / p128 (0069.jp2)
- ACKNOWLEDGMENTS / p131 (0070.jp2)
- LIST OF PAPERS CONCERNED WITH THIS THESIS / p132 (0071.jp2)
