Studies on radicals in CHF[3] ECR etching plasma using spectroscopic techniques 分光法を用いたCHF[3]ECRエッチングプラズマにおけるラジカルに関する研究

この論文をさがす

著者

    • 高橋, 邦方 タカハシ, クニマサ

書誌事項

タイトル

Studies on radicals in CHF[3] ECR etching plasma using spectroscopic techniques

タイトル別名

分光法を用いたCHF[3]ECRエッチングプラズマにおけるラジカルに関する研究

著者名

高橋, 邦方

著者別名

タカハシ, クニマサ

学位授与大学

名古屋大学

取得学位

博士 (工学)

学位授与番号

甲第3466号

学位授与年月日

1996-03-25

注記・抄録

博士論文

目次

  1. CONTENTS / p1 (0003.jp2)
  2. CHAPTER1.INTRODUCTION / p1 (0006.jp2)
  3. 1.1 Electron Cyclotron Resonance(ECR)Plasma Etching / p1 (0006.jp2)
  4. 1.2 Problems in Previous Studies / p2 (0007.jp2)
  5. 1.3 Purpose and Composition of Dissertation / p8 (0013.jp2)
  6. REFERENCE FOR CHAPTER1 / p10 (0015.jp2)
  7. CHAPTER2.METHOD FOR MEASURING [数式](X=1-3) RADICAL AND F ATOM DENSITIES / p11 (0016.jp2)
  8. 2.1 Infrared Diode Laser Absorption Spectroscopy(IRLAS)for [数式](X=1-3) Radical Measurements / p11 (0016.jp2)
  9. 2.2 Actinometric Technique for Measurement of F Atom Density / p16 (0021.jp2)
  10. REFERENCE FOR CHAPTER2 / p18 (0023.jp2)
  11. CHAPTER3.MEASUREMENTS OF [数式](X=1-3) RADICALS IN ECR PLASMA EMPLOYING CHF₃ / p19 (0024.jp2)
  12. 3.1 Introduction / p19 (0024.jp2)
  13. 3.2 Measurements of [数式](X=1-3) Radical Densities under Various Conditions in CHF₃ ECR Plasma / p19 (0024.jp2)
  14. 3.3 Mechanism of Production and Extinction Processes of [数式](X=1-3) Radicals in CHF₃ ECR Plasma / p25 (0030.jp2)
  15. 3.4 Summary / p33 (0038.jp2)
  16. REFERENCE FOR CHAPTER3 / p34 (0039.jp2)
  17. CHAPTER4.CONTROL OF [数式](X=1-3) RADICALS BY ON-OFF MODULATED ECR PLASMA / p35 (0040.jp2)
  18. 4.1 Introduction / p35 (0040.jp2)
  19. 4.2 Measurement of [数式](X=1-3) Radical Densities and Polymer Deposition Rates by Varying Duty Ratio in On-Off Modulated ECR Plasma / p36 (0041.jp2)
  20. 4.3 Control of [数式](X=1-3) Radical Densities in On-Off Modulated ECR Plasma / p39 (0044.jp2)
  21. 4.4 Mechanism of Polymer Film Formations in On-Off Modulated ECR Plasma / p44 (0049.jp2)
  22. 4.5 Summary / p49 (0054.jp2)
  23. REFERENCE FOR CHAPTER4 / p50 (0055.jp2)
  24. CHAPTER5.APPROACH FOR CONTROL OF CF₂ RADICAL AND CLARIFICATION OF SURFACE REACTION OF CF₂ RADICAL IN ECR PLASMA USING CF₂ RADICAL INJECTION TECHNIQUE / p51 (0056.jp2)
  25. 5.1 Introduction / p51 (0056.jp2)
  26. 5.2 Control of CF₂ Radical Density in ECR Etching Plasma Using CF₂ Radical Injection Technique / p52 (0057.jp2)
  27. 5.3 Clarification of a Precursor for Fluorocarbon Film Formation Using CF₂ Radical Injection Technique / p54 (0059.jp2)
  28. 5.4 Summary / p68 (0073.jp2)
  29. REFERENCE FOR CHAPTER5 / p69 (0074.jp2)
  30. CHAPTER6.EFFECTS OF H₂ OR O₂ ADDITION ON [数式](X=1-3) RADICALS AND SURFACE REACTIONS IN CHF₃ ECR PLASMA / p70 (0075.jp2)
  31. 6.1 Introduction / p70 (0075.jp2)
  32. 6.2 Effect of H₂ Addition on [数式](X=1-3) Radicals and Surface Reactions in CHF₃ ECR Plasma / p71 (0076.jp2)
  33. 6.3 Effect of O₂ Addition on [数式](X=1-3) Radicals and Surface Reactions in CHF₃ ECR Plasma / p87 (0092.jp2)
  34. 6.4 Summary / p97 (0102.jp2)
  35. REFERENCE FOR CHAPTER6 / p100 (0105.jp2)
  36. CHAPTER7.CONCLUSIONS / p103 (0108.jp2)
  37. 7.1 Summary of This Study / p103 (0108.jp2)
  38. 7.2 Scope for Future Work / p104 (0109.jp2)
  39. AKNOWLEDGMENTS / p107 (0112.jp2)
  40. PAPERS CONCERNED WITH THIS STUDY / p108 (0113.jp2)
  41. 1.ORIGINAL PAPERS / p108 (0113.jp2)
  42. 2.INTERNATIONAL CONFERENCES / p109 (0114.jp2)
0アクセス

各種コード

  • NII論文ID(NAID)
    500000131844
  • NII著者ID(NRID)
    • 8000000966478
  • DOI(NDL)
  • NDL書誌ID
    • 000000296158
  • データ提供元
    • NDL-OPAC
    • NDLデジタルコレクション
ページトップへ