Gas cluster ion-solid surface in teraction and thin film formation ガスクライスターイオンと固体表面の相互作用及び薄膜形成に関する研究
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Bibliographic Information
- Title
-
Gas cluster ion-solid surface in teraction and thin film formation
- Other Title
-
ガスクライスターイオンと固体表面の相互作用及び薄膜形成に関する研究
- Author
-
秋月, 誠
- Author(Another name)
-
アキズキ, マコト
- University
-
京都大学
- Types of degree
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博士 (工学)
- Grant ID
-
甲第7811号
- Degree year
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1999-03-23
Note and Description
博士論文
Table of Contents
- 論文目録 / (0001.jp2)
- Contents / p15 (0011.jp2)
- 1 Introduction / p1 (0012.jp2)
- 1.1 Ion beam processing / p1 (0012.jp2)
- 1.2 Advantages of the gas cluster ion beam technique / p2 (0013.jp2)
- 1.3 Issues of thin film formation in electronic devices / p4 (0014.jp2)
- 1.4 The purpose of this study / p7 (0015.jp2)
- 2 Gas cluster ion beam apparatus / p9 (0016.jp2)
- 2.1 Introduction / p9 (0016.jp2)
- 2.2 The principle of gas cluster generation / p10 (0017.jp2)
- 2.3 10 kV gas cluster ion beam apparatus / p10 (0017.jp2)
- 2.4 30 kV gas cluster ion beam apparatus / p22 (0023.jp2)
- 2.5 200 kV gas cluster ion beam apparatus / p22 (0023.jp2)
- 2.6 Generation of intense gas cluster beams / p25 (0024.jp2)
- 2.7 Generation of high-current gas cluster ion beams / p37 (0030.jp2)
- 2.8 Generation of gas cluster ion beams from liquid sources / p45 (0034.jp2)
- 2.9 Summary / p50 (0037.jp2)
- 3 Gas cluster ion-solid surface interaction / p53 (0038.jp2)
- 3.1 Introduction / p53 (0038.jp2)
- 3.2 Low energy effect / p56 (0040.jp2)
- 3.3 High yield sputtering and surface smoothing / p63 (0043.jp2)
- 3.4 Enhancement of surface chemical reaction / p88 (0056.jp2)
- 3.5 Molecular Dynamics simulation / p96 (0060.jp2)
- 3.6 Summary / p102 (0063.jp2)
- 4 Oxide film formation by O₂ cluster ion beams / p109 (0066.jp2)
- 4.1 Introduction / p109 (0066.jp2)
- 4.2 Experimental procedure / p111 (0067.jp2)
- 4.3 Room-temperature oxidation of by O₂ cluster ion oxidation / p114 (0069.jp2)
- 4.4 Low-temperature formation of lead-base oxide films by O₂ cluster ion-assisted deposition / p120 (0072.jp2)
- 4.5 Transparent conductive oxide film formation by O₂ cluster ion-assisted deposition / p135 (0079.jp2)
- 4.6 Summary / p149 (0086.jp2)
- 5 Conclusions / p153 (0088.jp2)
- List of publications / p157 (0090.jp2)
