Studies on fabrication of low-dielectric-constant siloxane film by plasma processes

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著者

    • 藤井, 俊明 フジイ, トシアキ

書誌事項

タイトル

Studies on fabrication of low-dielectric-constant siloxane film by plasma processes

著者名

藤井, 俊明

著者別名

フジイ, トシアキ

学位授与大学

名城大学

取得学位

博士(工学)

学位授与番号

甲第35号

学位授与年月日

1999-03-18

注記・抄録

博士論文

目次

  1. CONTENTS / p1 (0003.jp2)
  2. CHAPTER 1.INTRODUCTION / p1 (0004.jp2)
  3. 1.1 Technology of Multilevel Interconnection for ULSI Devices / p1 (0004.jp2)
  4. 1.2 Materials Possessing Siloxane Structures / p8 (0008.jp2)
  5. 1.3 Problems of Previous Studies on Fabrication of Low-Dielectric-Constant Film / p11 (0009.jp2)
  6. 1.4 Purpose and Composition of This Thesis / p17 (0012.jp2)
  7. REFERENCES FOR CHAPTER 1 / p23 (0015.jp2)
  8. CHAPTER 2.DEVELOPMENT OF NEW TECHNIQUE FOR FORMATION OF POLYSILOXANE FILM USING CO₂ LASER EVAPORATION ASSISTED BY REMOTE RADICAL SOURCE / p29 (0018.jp2)
  9. 2.1 Introduction / p29 (0018.jp2)
  10. 2.2 New System Using CO₂ Laser Evaporation Assisted by Remote Radical Source / p30 (0019.jp2)
  11. 2.3 Results and Discussion / p32 (0020.jp2)
  12. 2.4 Summary / p52 (0030.jp2)
  13. REFERENCES FOR CHAPTER 2 / p53 (0030.jp2)
  14. CHAPTER 3.FORMATION OF LOW-DIELECTRIC-CONSTANT FILM FROM LASER-EVAPORATED SILOXANE WITH OXYGEN RADICAL INJECTION / p55 (0031.jp2)
  15. 3.1 Introduction / p55 (0031.jp2)
  16. 3.2 Experimental / p56 (0032.jp2)
  17. 3.3 Results and Discussion / p60 (0034.jp2)
  18. 3.4 Summary / p69 (0038.jp2)
  19. REFERENCES FOR CHAPTER 3 / p70 (0039.jp2)
  20. CHAPTER 4.FORMATION OF LOW-DIELECTRIC-CONSTANT FILM BY PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION EMPLOYING HEXAMETHYLDISILOXANE / p71 (0039.jp2)
  21. 4.1 Introduction / p71 (0039.jp2)
  22. 4.2 Experimental / p72 (0040.jp2)
  23. 4.3 Results and Discussion / p74 (0041.jp2)
  24. 4.4 Summary / p97 (0052.jp2)
  25. REFERENCES FOR CHAPTER 4 / p98 (0053.jp2)
  26. CHAPTER 5.CONCLUSIONS / p99 (0053.jp2)
  27. 5.1 Summary of This Study / p99 (0053.jp2)
  28. 5.2 Scope for Future Research / p103 (0055.jp2)
  29. ACKNOWLEDGEMENTS / p107 (0057.jp2)
  30. LIST OF PAPERS CONCERNED WITH THIS DISSERTATION / p111 (0059.jp2)
  31. 1.Original Papers / p111 (0059.jp2)
  32. 2.International Conferences / p112 (0060.jp2)
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各種コード

  • NII論文ID(NAID)
    500000172662
  • NII著者ID(NRID)
    • 8000000172938
  • DOI(NDL)
  • NDL書誌ID
    • 000000336976
  • データ提供元
    • NDL-OPAC
    • NDLデジタルコレクション
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